| |
| | Patentee Index |
 | | Halliyal, Arvind; Ramsbey, Mark T.; Chang, Kuo-Tung; Tripsas, Nicholas H.; and Ogle, Robert B., to Advanced Micro Devices, Inc. Use of high-K dielectric material in modified ONO structure for semiconductor devices 06803272 Cl. 438-240. |
 | | Hong, Jin Pyo; Lee, Chang Hyo; Kim, Chae Ok; Yoon, Kap Soo; and Lee, Sung Bok, to Hanyang Hak Won Co., Ltd. Method for manufacturing half-metallic magnetic oxide and plasma sputtering apparatus used in the same 06802949 Cl. 204-298.16. |
 | | Wei, Wei-Hsin; Ho, Sheng-Yi; and Chang, Jung-Lin 06803798 Cl. 327-178. |
| www.uspto.gov /web/patents/patog/week41/OG/patentee/alphaH.htm |
|