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| | United States Patent: 6,261,751 (Site not responding. Last check: 2007-10-08) |
 | | The antireflective coating of claim 1, in which the second layer is substantially transmissive of a wavelength of incident light, wherein the wavelength is ultraviolet or deep ultraviolet, and the first layer is substantially absorptive of the wavelength of incident light. |
 | | In one embodiment, the second layer is substantially transmissive of a wavelength of incident light, wherein the wavelength is ultraviolet (UV) or deep ultraviolet (DUV), and the first layer is substantially absorptive of the wavelength of incident light. |
 | | However, shorter wavelengths of incident light 120, such as ultraviolet (UV) and deep ultraviolet (DUV) wavelengths, typically result in increased reflection from the working surface 100A of underlying substrate 100 when conventional photolithographic techniques are used. |
| web.engr.oregonstate.edu /~flf/6261751.html (5661 words) |
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