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| | Plasma Etching - Anatech LTD |
 | | Similarly, plasma etching has grown from the use of relatively simple, parallel-plate configurations for a variety of films, to million-dollar modular chambers with multiple frequency generators, electrostatic chucks, externally controlled wall temperatures, and a variety of process control sensors designed specifically for one type of film. |
 | | Etch selectivity to different films is also essential, since resist material is occasionally inadequate to provide a sufficient mask for features which must be etched. |
 | | To etch a Si trench, for example, an oxide layer must be defined as a mask for the Si, since the presence of organics during trench etching can degrade process performance. |
| www.anatechusa.com /Plasma_Etching/default.html?kc=TgcqyWgZCg6fmGC1OVfD30dTlgmPWfbynDZy25rg (998 words) |
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