| | Gunn diode patent invention |
 | | The tapered shape of the Gunn diode (referred to as a mesa) is characteristic of the wet etching process, and arises because the top of the structure is exposed to the etchant for longer than the material at the bottom. |
 | | A typical Gunn diode current is 600 mA at a voltage bias of 5.5 volts, but the length of the transit region may be a fraction of a millimetre so the voltage gradient developed across the region is in the range of Kilovolts per millimetre at which the formation of domains starts. |
 | | It is necessary that the Gunn diode undergoes resonance at the fundamental as well, otherwise the resonance at the second or higher harmonic could not be supported, but means, such as a resonator, may be provided to hold the resonance at the fundamental, so that it is not transmitted. |
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