| | [No title] (Site not responding. Last check: 2007-10-18) |
 | | A HEMT according to Claim 2 wherein: said passivation layer is on said second undoped aluminum nitride layer; said aluminum gallium nitride active structure comprises an undoped layer of aluminum gallium nitride; and said passivation layer is selected from the group consisting of silicon dioxide and silicon nitride. |
 | | A HEMT according to Claim 13 wherein: said passivation layer is selected from the group consisting of silicon nitride and silicon dioxide; said heterojunction comprises adjacent layers of aluminum gallium nitride (AlGaN) and gallium nitride (GaN); and said HEMT further comprising an aluminum nitride buffer layer between said substrate and said heterojunction structure. |
 | | A HEMT according to Claim 13 wherein: said ohmic contacts comprise an alloy of titanium, aluminum, and nickel and said rectifying gate contact is selected from the group consisting of titanium, platinum, chromium, alloys of titanium and tungsten, and platinum silicide; and said source and drain contacts comprise an alloy of titanium, silicon, and nickel. |
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