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Topic: Ion beam


  
  Ion beam - Wikipedia, the free encyclopedia
Today's ion beam sources are typically derived from the mercury vapor thrusters developed by NASA in the 1960s.
Ion beam etching is a technique conceptually similar to sandblasting, but using individual atoms in an ion beam to ablate a target.
Ion beams are also used in materials science to thin samples or specific regions of samples for transmission electron microscope analysis.
en.wikipedia.org /wiki/Ion_beam   (285 words)

  
 Ion beam transport
The transport of ion beams is of importance to many applications, including the field of ion beam driven inertial confinement fusion.
One possible method to accomplish this is ion beam transport in a laser initiated discharge channel, where a plasma channel and the magnetic field created by the discharge are used to neutralize the space charge of the ion beam and to prevent beam divergence.
The ion beam is visualized in a fast plastic scintillator which is protected from the laser beam and the light of the discharge by a 10 µm aluminum foil.
www.gsi.de /forschung/pp/experiments/transport/index_e.html   (971 words)

  
 Ion Source Technology
Ion Sources and Electron Guns Although the acceleration of particle beams is understood by accelerator physicists, the source of the primary particles is often cloaked in mystery.
Ion Beam Analysis (IBA) is based on the interaction, at both the atomic and the nuclear level, between accelerated charged particles and the bombarded material.
Ion Beam Laborator y -We study the interaction of energetic ions with solid to understand the mechanisms leading to electronic excitations and how these excitations evolve and lead to the emission of light (luminescence), electrons, radiation, atoms and molecules (sputtering), and to radiation damage, chemical changes or heat.
www.casetechnology.com /source.html   (930 words)

  
 Research News:Carving New Frontiers for Ion-Beam Technology
Focused ion beams are important in the semiconductor industry, where they are used to carve structures with dimensions measured in billionths of a meter, repair defects in masks used for photolithography, isolate and analyze elements of integrated circuits, "dope" semiconductors with specific atomic species, and perform other tasks.
In the second chamber an ion beam is formed and accelerated by a lower voltage, which does not impede the high-energy electron beam.
The self-neutralizing, mixed beam stays tight on its way to the target, because with electrons present there is little "space charge" — the positive ions do not push one another apart — nor does it charge the sample upon striking it.
www.lbl.gov /Science-Articles/Archive/AFRD-Ion-Beam-Tech.html   (1161 words)

  
 
Focused Ion Beam Nanofabrication
  (Site not responding. Last check: 2007-11-06)
Focused ion beams are widely used for the mask repair, implantation, milling, deposition and secondary electron/ion imaging.
Focused ion beams are the main profile of the Laboratory for Ion Beam Research and Applications, University of Maryland.
Ion beam scans the surface in a choosen pattern resulting in the material removal.
www.ipr.umd.edu /ionbeam/ast-fib.html   (258 words)

  
 James Ziegler - SRIM & TRIM
Ion Stopping and Range in Targets: Most aspects of the energy loss of ions in matter are calculated in SRIM, the S topping and R ange of I ons in M atter.
Ion Implantation : Ion beams are used to modify samples by injecting atoms to change the target chemical and electronic properties.
Ion Transmission: Ion beams can be followed through mixed gas/solid target layers, such as occurs in ionization chambers or in energy degrader blocks used to reduce ion beam energies.
www.srim.org   (1145 words)

  
 Light Ion Beam Fusion Technology at Sandia National Laboratories
Ion beams provide the ability for medium distance transport (4 m) of the ions to the target, and standoff of the driver from high-yield implosions.
The ion source plasma strongly governs the achievable beam current density and divergence, as well as the impedance history of the diode that impacts the sustainable pulse length.
With an adequate ion source, pulsed-power-driven light-ion-beam fusion offers a robust technology with efficiency, target standoff and rep-rate at what may be the lowest cost of electricity, and could prove to be the key technology for power generation in the next century.
www.sandia.gov /capabilities/pulsed-power/hedicf/ionsource/ionsource.html   (6997 words)

  
 Ion Beam Laboratory at the University of Virginia
Ion Beam Laboratory at the University of Virginia
We study the interaction of energetic ions with solid to understand the fundamental mechanisms leading to electronic excitations and how these excitations evolve and lead to the emission of light (luminescence), electrons, atoms and molecules (sputtering), and to radiation damage, chemical changes or heat.
The emission of electrons from ultrathin (~5 nm) carbon foils traversed by ion beams is studied to understand the sensitivity of time-of-flight (TOF) spectrometers used in space exploration and in the laboratory for surface analysis of materials.
www.virginia.edu /ep/LASP/ion.html   (795 words)

  
 Norsam Technologies - Nano Technology, Microtooling, Archival Preservation and Gemstone Marking   (Site not responding. Last check: 2007-11-06)
The ion beam marking of diamonds and other gemstones is an elegant and safe way to provide a permanent mark on the table of cut and polished gemstones.
The ion beam is a gentle process versus the energy pulse that hits a gemstone when exposed to laser.
Focused ion beam marking is the pinnacle of high technology and elegant craftsmanship on one of life's most important purchases.
www.norsam.com /diamond.html   (430 words)

  
 Ion beam milling
The position of the ion source and the optical surface (the distance between the ion source and the optical surface and the shift of the ion source from the axis of surface).
In practice it means that using the ion beam with the diameter of 30 — 50 mm (depending on the distance from the ion source for the beams with divergence) you can successfully mill the optical surfaces with diameters more than 200 mm — 250 mm.
The depth of surface layer that should be sputtered at the point of intersection of the ion beam axis with the surface (or the sputtering time for the known sputtering rate).
home.earthlink.net /~chutko/milling.htm   (2591 words)

  
 ASU IBeAM Facility
Ion beam analysis (IBA), using MeV ion beams for compositional and structural determination of materials, combines the advantages of non-destructive and standardless analysis of the surface and near surface regions (0-2 microns) of solids.
A variation of RBS is ion channeling, in which a single crystal sample is aligned on a goniometer in situ so that one of its major symmetry axes is parallel to the incident MeV ion beam.
H atoms are scattered from the sample (by the incident accelerated ions) and energy analyzed for concentration and depth distribution.
www.ibeam.asu.edu   (425 words)

  
 Vacutron: Advanced Ion Beam Technology   (Site not responding. Last check: 2007-11-06)
Control of the ion energy requires adjustment of the plasma potential (bias voltage), which is known as the "beam voltage." The beam of hydrocarbon ions is then aimed at the substrate to be coated.
Ion beam overcoats are continuous, even at low thicknesses.
Ion beam technology can deposit thinner DLC coatings, but they will have to be engineered for the appropriate slider and disk application.
www.vacutrontechnologies.com /support2.html   (1701 words)

  
 FOCUSSED ION BEAM TECHNOLOGY
The ion beam is generated in a liquid-metal ion source (LMIS), and the application of a strong electric field causes emission of positively charged ions from a liquid gallium cone, which is formed on the tip of a tungsten rod.
Ion beams can also be used to remove material from the surface of the sample.
In these applications, the beam parameters and gas flow are optimized for the most efficient equilibrium between the cracking of the precursor gases and the milling action of the beam.
dsa.dimes.tudelft.nl /usage/technology/FIB   (887 words)

  
 Diamonex - Ion-Beam Systems - Systems
In the early to mid-1990’s, DIAMONEX pioneered the use of ion beam processes for the deposition of diamond-like carbon (DLC) films for sunwear, other optical coating applications such as barcode scanner windows, and magnetic heads.
Commercially available grided ion beam sources operating on reactive deposition gases such as hydrocarbons were used in these manufacturing processes.
It was found that these ion sources required extensive maintenance due to material build-up on the internal surfaces of the plasma chamber and on the grids.
www.diamonex.com /ibs_systems.htm   (713 words)

  
 Ion Beam Etching   (Site not responding. Last check: 2007-11-06)
Ions are generated ina discharge chamber, bombarded and ionized by energetic electrons.
Ion beam is formed when ions fromt eh discharge plasma pass throught the apertures in the screen grid and attracted to the negively biased accelerator grid, achieving energies from 100eV to 1000eV.
The ion beam need to be neutralized with electron beam to keep the ion from spreading out from mutual repulsion, and to etch insulator effectively.
insti.physics.sunysb.edu /~zheng/research/ion_milling.html   (388 words)

  
 Ion beam polishing/milling system   (Site not responding. Last check: 2007-11-06)
During ion beam polishing a low temperature infra- red probe mounted on a ZnSe window outside the vacuum chamber simultaneously examines the sample surface to monitor the surface temperature.
After setting the z height of the stage to a canonical value (accounting for sample thickness), the laser beam and ion beam are confocal, and the sample may be steered in X and Y until the laser is on the appropriate part of the sample.
Both stages are fully motorised in all axes, and the apparatus was supplied with a 19" rack unit to house the ion beam controller, various vacuum gauge controllers and pump supplies, the stage motorisation modules, the surface temperature display, the camera and laser supplies and the mains distribution box.
www.kore.co.uk /1027.htm   (400 words)

  
 Michigan Ion Beam Lab   (Site not responding. Last check: 2007-11-06)
The ion beam assisted deposition (IBAD) system can produce films or coatings of many materials by electron beam evaporation with simultaneous bombardment by a low energy ion beam in ultra high vacuum.
Ion channeling is a variant of RBS which utilizes the crystallographic nature of the target for the purpose of determining the lattice location of species and the quality of the crystal.
Helium ions, accelerated along open channels in selected crystallographic directions return information on the location of interstitial atoms (solutes or impurities), the amount of damage or imperfections in the crystal, and the thickness of an amorphous layer.
www.engin.umich.edu /research/mibl/capabilities.html   (580 words)

  
 Carving new frontiers for ion-beam technology
Complicating these applications, however, is the fact that "problems arise when positive ions are used for imaging or micromachining insulating materials," says Qing Ji, who authored the "Applied Physics Letters" report with her colleagues Lili Ji, Ye Chen, and Ka-Ngo Leung.
The group came up with a novel solution: instead of a liquid-metal ion source, standard in many focused ion beam devices, the new system uses two chambers in which plasma is generated by radio-frequency electromagnetic fields, which separate gas molecules into their component electrons and positive ions.
The self-neutralizing, mixed beam stays tight on its way to the target, because with electrons present there is little "space charge" -- the positive ions do not push one another apart -- nor does it charge the sample upon striking it.
www.eurekalert.org /pub_releases/2004-11/dbnl-cnf110104.php   (1024 words)

  
 Ion Beam Lithography   (Site not responding. Last check: 2007-11-06)
This is a variation of the electron beam lithography technique, using an focused ion beam (FIB) instead of an electron beam.
With raster scan, the electron beam is scanned across lines of pixels and the wafer is shifted to the next line.
Several ion beam resists are self-developing, in that exposure to the ion beam completely disintegrates the substance.
ece.pdx.edu /~jeske/litho/ionbeamlitho.html   (323 words)

  
 IGISOL   (Site not responding. Last check: 2007-11-06)
These studies are performed locally at the Jyväskylä Ion Guide Isotope Separator On-Line (IGISOL) facility, as well as at a number of other laboratoriessuch as the ISOLDE facility in CERN, at GANIL and at the isotope separator in GSI.
Essential parts of the facility are a radiofrequency quadrupole ion cooler and the JYFLTRAP tandem Penning trap, installed in 1999 and 2002, respectively.
The ion cooler is used to improve the ion beam quality and bunch the beam for laser spectroscopy and the Penning trap.
www.phys.jyu.fi /research/igisol   (305 words)

  
 Ion Beam Analysis   (Site not responding. Last check: 2007-11-06)
Ion Beam Analysis (IBA) utilizes high-energy ion beams to probe elemental composition non-destructively as a function of depth to several microns with a typical depth resolution of 100-200 angstroms.
Unlike ion scattering techniques, NRA is an isotopically sensitive technique with an excellent mass resolution and has no mass-depth ambiguity of RBS and FReS in data interpretation.
Beam current on target up to a few tens to hundreds nA depending on ion species and energies.
resolution.umn.edu /InstDesc/IBAdesc.html   (899 words)

  
 Surface Spectroscopy of Nano and Subnano Structures
Such highly charged projectile ions carry up to several hundred keV potential energy for which x-ray emission studies are particularly suitable especially with respect to illumination of interaction processes that lead to the transfer of this potential energy to the surface.
In the extraction phase, the ions are electrostatically deflected and focused through an einzel lens in the path between the MEVVA into the trap.
In this connection, we note that for the incident projectile ions such as Bi to Bi the 3d shell of the incoming ions is completely filled and no M x-rays are expected.
www.foresight.org /Conferences/MNT05/Papers/Bruch/index.html   (3246 words)

  
 Nanosecond Pulsed Ion Beam System for Time of Flight Surface Analysis   (Site not responding. Last check: 2007-11-06)
Pulsed ion beams of short duration are used in Time of Flight ion scattering measurements for surface analysis.
A Duoplasmatron Ion Source produces an intense beam of gaseous ions (H, He,) which are then extracted by an Extraction Gap.
A divergent beam of ions is produced with energies variable from 3 to 25 keV.
www.channel1.com /peabodyscientific/page21.html   (185 words)

  
 Colutron ion beam kits and components
The Colutron Ion Beam Kit consists of an ion source, heat sink, acceleration and focusing system, vertical deflection plates, velocity filter, and velocity filter guard ring control unit (not shown).
The energy spread of the ion beams produced by the Colutron ion source have been measured to be as low as 0.11 eV.
The Colutron Ion Source is a convenient plug-in unit that eliminates handling and assembling of a number of small parts, as with conventional ion sources.
www.colutron.com /products/kit/kit.html   (1656 words)

  
 === Machining journal of ion beam machining ===
Picking the top journal of ion beam machining e-commerce portals is not easy.
Choosing appropriate journal of ion beam machining can be time consuming.
I'm amazed that it took us so long to go through all the info about journal of ion beam machining and select a couple of the very best sites for you to visit.
www.sightings-in1.com /machining/journal-of-ion-beam-machining.htm   (168 words)

  
 Surrey Ion Beam Centre   (Site not responding. Last check: 2007-11-06)
The new machines that have been commissioned in the Ion Beam Centre over the past few years have enabled it to increase the through-put of samples and at the same time the machine reliabilities have improved.
The actual sample temperature as opposed to the chuck temperature varies from holder to holder due to beam heating, depending on the beam conditions and is a parameter that we wish to have greater control over in the future.
Likewise, ion beam synthesis and defect engineering will play an increasingly important role in nano-electronics, optoelectronics and materials where the ability to modify very small regions to ultra-shallow depths in a reproducible and controlled manner will be a requirement.
www.ee.surrey.ac.uk /ibc/index.php?target=3:9   (2518 words)

  
 Ion-Beam-Group   (Site not responding. Last check: 2007-11-06)
This research group uses ion beams in the MeV-range for the investigation of solids and their surfaces.
The ion beam is generated in a Pelletron-accelerator and then enters one of the two scattering chambers.
In combination with ion channeling the techniques can be used for studying structural properties of solids.
ionix.mpi-stuttgart.mpg.de /homee.html   (134 words)

  
 Focused Ion Beam   (Site not responding. Last check: 2007-11-06)
In the focused ion beam system (FIB), a highly focused ion beam is aimed at a target area on the sample.
As the beam scans the surface of the sample, a highly magnified image is created, allowing the system operator to clearly view the samples microscopic features.
The ion beam itself could be used to perform spatially confined Ga-doping.
www.fke.tuwien.ac.at /silizium/alois/FIB_processing.htm   (263 words)

  
 Sandia National Labs: Doing Business: Partnerships: Technology Access: User Facilities: Ion Beam Materials Research ...
Invented several new ion beam analysis techniques for the quantitative analysis of light elements (H through F), and heavy elements (C through Pu).
Ion channeling to probe the atomic structure of a material in the near surface, allowing the depth profiling of defects and strain
To make arrangements to use the Ion Beam Materials Research Laboratory, contact the user liaison or visit the IBA Table of Elements site to quickly retrieve information on the sensitivity, depth of analysis and depth resolution of most of the modern ion beam analysis techniques in a single easy to use format; a periodic table.
www.sandia.gov /bus-ops/partnerships/tech-access/facilities/beam-materials.html   (391 words)

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