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	Cluster Ion Source
		The depth of this damaged or "altered layer" is directly related to the penetration depth of the primary ion and is largely responsible for determining the depth resolution of a SIMS depth profile.
		Because a cluster ion dissociates upon impact with a surface, the penetration depth of the constituents of the cluster are greatly reduced as compared to monoatomic primary ion bombardment under the same conditions.
		The cluster ions are produced by energetic Cs+ bombardment of a graphite target in the source region.
	www.cstl.nist.gov /div837/Division/techac/1999/ClusterIonSource.htm (598 words)

	The Ion Source
		The ion source has a chamber which is short in length, relative to its transverse dimensions, and the RF antenna is at an even shorter distance from the plasma grid, which contains one or more extraction apertures.
		Positive ions are expelled from the discharge by a negatively biased Extraction electrode.
		Ions exiting the source combine downstream to form a broad beam which is used for ion beam treatment of a silicon wafer.
	www.casetechnology.com /implanter/source.html (629 words)

	Ion Source Technology
		Ion sources from National Electrostatics Corp. are used to produce a full range of positive and negative ion beam species.
		Ion Beam Analysis (IBA) is based on the interaction, at both the atomic and the nuclear level, between accelerated charged particles and the bombarded material.
		Ion Beam Laboratory -We study the interaction of energetic ions with solid to understand the mechanisms leading to electronic excitations and how these excitations evolve and lead to the emission of light (luminescence), electrons, radiation, atoms and molecules (sputtering), and to radiation damage, chemical changes or heat.
	www.casetechnology.com /source.html (1131 words)

	Ion Source for Sample Cleaning in UHV
		The ISIS3000 ion source produces a high current, variable energy ion beam for the cleaning of sample surfaces in UHV.
		The ion source comprises an oscillating electron discharge source with electrostatic extraction and focusing lens.
		The ions are extracted and focused into a spot of approximately 10 mm diameter at the sample surface where the impact of the energetic ions physically removes surface material thus cleaning the sample.
	www.topac.com /ions.html (258 words)

	Microwave ion source - Patent 4857809 (Site not responding. Last check: 2007-10-09)
		No ion source has been proposed wherein long-lifetime and stable operation for a reactive gas are guaranteed, a beam size is about (10 to 20) mm.times.(20 to 50) mm, and a total ion current is about 100 to 200 mA (corresponding to an ion current density of 75 to 150 mA/cm.sup.2).
		In the ion source structure of this embodiment, therefore, the plasma limiter 12 having a rectangular plasma transport opening 12A which is small as compared with the sectional area of the plasma generation chamber 7 is formed in the cavity of the chamber 7 as described above.
		An ion extraction window of an ion extraction electrode system has seven circular apertures (each having a diameter of 4.2 mm) arranged in a circular configuration (having a radius of 20 mm; and one aperture is located at the center of a hexagon, and the remaining six apertures are located at vertices of the hexagon).
	www.freepatentsonline.com /4857809.html (5447 words)

	Ion source - Wikipedia, the free encyclopedia
		H-Minus ions are generated with a magnetron or a Penning source.
		Gas flows through the ion source between the anode and the cathode.
		Ions from the plasma are repelled by the anode electric field.
	en.wikipedia.org /wiki/Ion_source (536 words)

	Laser Ion Source Simulations for the University Microbeam Columbia
		Ion trajectories in this source experienced in turn, 70 cm of plasma expansion drift, a 180° cylindrical ESA, two Einzel lenses, and a final drift distance to a detector whose position would effectively be the location of the 3.18 mm diameter entrance aperture of the particle accelerator.
		In a typical case, the vertical extent of the ion beam was acceptable for input to the accelerator aperture.
		This limitation to the ion source prototype was an artifact of the ion optical geometry.
	cpmcnet.columbia.edu /dept/radoncology/raraf/lis-simulations.htm (1498 words)

	NASA - Ion Propulsion
		In a conventional ion thruster, electrons are generated by a hollow cathode, called the discharge cathode, located at the center of the engine on the upstream end.
		Since the ions are generated in a region of high positive and the accelerator grid's potential is negative, the ions are attracted toward the accelerator grid and are focused out of the discharge chamber through the apertures, creating thousands of ion jets.
		Because the ion thruster expels a large amount of positive ions, an equal amount of negative charge must be expelled to keep the total charge of the exhaust beam neutral.
	www.nasa.gov /centers/glenn/about/fs21grc.html (1894 words)

	Ion beam milling
		The radius of curvature of the milled surface for concave, convex and, of course, plane surfaces.
		The position of the ion source and the optical surface (the distance between the ion source and the optical surface and the shift of the ion source from the axis of surface).
		In practice it means that using the ion beam with the diameter of 30 — 50 mm (depending on the distance from the ion source for the beams with divergence) you can successfully mill the optical surfaces with diameters more than 200 mm — 250 mm.
	home.earthlink.net /~chutko/milling.htm (2590 words)

	Ernest O. Lawrence - Patents - 1957 through 1960
		Withdrawal of the ions from the source is accomplished by an accelerator electrode placed at a positive potential with respect to the receiver.
		An ion source is presented for calutrons, particularly an electrode arrangement for the ion generator of a calutron ion source.
		These plates are electrically insulated from the body of the ion source and are connected to a suitable source of voltage to serve as electrodes for shaping the ion beam egressing from the arc chamber.
	www.osti.gov /accomplishments/lawrencepat2.html (1206 words)

	Cassini-Huygens: Spacecraft-Instrument-Ion and Neutral Mass Spectrometer (INMS)
		The Ion and Neutral Mass Spectrometer (INMS) is intended to measure positive ion and neutral species composition and structure in the upper atmosphere of Titan and magnetosphere of Saturn, and to measure the positive ion and neutral environments of Saturn's icy satellites and rings.
		The major functional components of the INMS Subsystem are an open ion source, a closed ion source, a quadrupole deflector and lens system, a quadrupole mass analyzer, and a dual detector system.
		Ions are directed to the mass analyzer from the selected ion source by changing the potentials on a 90-degree quadrupole deflector.
	saturn.jpl.nasa.gov /spacecraft/inst-cassini-inms-details.cfm (427 words)

	12-inch Cyclotron Ion Source
		Ions are produced in the center of the 12-inch cyclotron by the simple method employing a biased hot filament.
		Fig.5 The new ion source mounted near the floor of the cyclotron.
		After successfully operating the new ion source for about 10 hours, it was decided to open the chamber for an inspection.
	www.physics.rutgers.edu /cyclotron/12inchion.shtml (918 words)

	Note 70- Application of Simion to a study of the Finkelstein Ion Source,
		Both a generic conventional ion source and a Finkelstein source are modeled and comparisons are made of their efficiencies.
		The fraction of ions lost through this route is a function of the size and depth of the rectangular opening used to admit electrons into the source.
		While the greater magnetic fields and extraction voltage improved the collection of ions, we were concerned that the broadened spatial and kinetic energy distribution of the ions would adversely effect the mass filtering properties of the quadrupoles.
	www.sisweb.com /referenc/applnote/app-70.htm (1775 words)

	Ion Source (Site not responding. Last check: 2007-10-09)
		The external surface of the source chamber is surrounded by colums of permanent magnets (consisting of samarium-cobalt) which generate longitudinal line-cusp magnetic fields that can confine the primary ionizing electrons efficiently.
		In the production of radioactive ion beams for nuclear physics experiments, an ion source with axial energy spread less than 1 eV is needed to perform isobaric separation with a magnetic deflection spectrometer.
		The multicusp source is capable of producing large volumes of uniform, quiescent and high-density plasmas with high gas and electrical efficiencies.
	www.nuc.berkeley.edu /students/yhlee/source.html (268 words)

	Colutron ion beam kits and components
		The energy spread of the ion beams produced by the Colutron ion source have been measured to be as low as 0.11 eV.
		The Colutron Ion Source is a convenient plug-in unit that eliminates handling and assembling of a number of small parts, as with conventional ion sources.
		When the source with oven is not used, the extra two feedthroughs could be used for thermocouple wires etc. The Colutron ion source can be used for either solids or gasses.
	www.colutron.com /products/kit/kit.html (1655 words)

	Plasma Source as atom source, ion source and atom/ion hybrid source (microwave plasma source)
		The tectra Plasma Source* is a multi-purpose source which can easily be user configured to produce either atoms or ions and finds uses in a wide range of HV and UHV applications.
		Integration of the robust microwave generator and the ion source, mean that no tuning of the source is required and there is no waveguide to construct or install.
		Samples mounted a few centimetres from the source are said to be “downstream” of the ion source and away from the most energetic species.
	www.plasma-source.de (1215 words)

	What is a Kaufman Ion Source? - Ionbeam Scientific
		The Kaufman type Ion Source is typically considered to be a gridded broad beam ion source of permanent magnet design, with thermionic cathode filament to provide a source of electrons to support a magnetically confined plasma discharge.
		An additional source of electrons, usually being required for ion beam neutralisation, is provided by tungsten filament, hollow cathode electron source, or plasma bridge neutraliser.
		Permanent magnet ion sources of this type have been produced in a range of sizes with a variety of grid optics producing ion beams from 1cm to 38cm diameter, with a beam half angle of approximately 12°.
	www.ionbeam.co.uk /kaufmanionsource.asp (168 words)

	Plasma Ion Source, filamentless microwave ECR source, rf, plasma, microwave, ECR, plasma ion source, atom source, broad ... (Site not responding. Last check: 2007-10-09)
		The source can be operated in four distinct modes, according principally to the extraction optics fitted and covering a wide range of ion energies and particle types.
		This mode combines atom source and ion source behavior to produce a source which behaves like the atom source at (1.) above until potentials are applied to the extraction grids when ions are then added to the beam.
		Removes the residual ion current from the beam when the source is being used in atom source mode.
	www.specs.de /products/MBE/Ion-Source/Mini-Plasma-Source.htm (981 words)

	RF Ion Sources
		The Oxford Applied Research RF ion sources are employed in applications where ion-beam etching, sputter deposition or assisted deposition are required with minimal contamination.
		The sources can be equipped with a variety of grids, to tailor the beam profile to a particular application.
		One of the primary advantages of RF sources over filament-driven DC ion sources is the resistance they demonstrate to attack by reactive gases.
	www.oaresearch.co.uk /RFion.htm (627 words)

	Negative Ion Beam Sources for Pelletron® electrostatic accelerators
		This sputter cathode source, shown at left with the extractor/lens assembly, produces ion beams for all elements which form a stable negative ion.
		The source design is patterned after the RF-charge exchange ion source built by Professor H.T. Richards at the University of Wisconsin, Madison, Department of Physics.
		This source uses the sideways displacement of the intermediate (Zwischen) electrode to maximize the negative ion output.
	www.pelletron.com /negion.htm (981 words)

	Nuclear Structure Laboratory, SNICS II Sputter Ion
		This source has been in operation since 1989, and is the primary ion source for the FN Tandem accelerator, producing all the ion beams for injection into the FN Tandem with the exception of helium beams.
		The positively charged cesium ions leaving the ionizer are accelerated toward and focused onto the cathode, sputtering material from the cathode at impact.
		A wide variety of ion beams can be produced with this source, depending upon the nature of the cathode used.
	www.nd.edu /~nsl/Research_Facilities/Snics/nsl_snics.html (354 words)

	electrostatic accelerator system tutorial
		The purpose of the ion source is to produce either positive or negative ions from neutral atoms.
		Positive ion sources are placed inside the tank of a single-ended accelerator; negative ion sources inject the ion beam into the tank of a tandem accelerator.
		With the ion source(s) external to the pressure vessel, maintenance requiring entry into the tank and letting the acceleration tubes up to atmosphere is minimized.
	www.pelletron.com /tutor.htm (724 words)

	Colutron ion source charge preparation data base
		The salt from either source is fused in a nickel reactor by induction heating before being used in the calutron.
		Source, receiver, and liner components are washed with dilute sulfuric acid, and the wash solution is filtered to remove any solids.
		The source, receiver, and liner are washed in nitric acid and the solution is filtered and evaporated to a small volume.
	www.colutron.com /products/chargeprep.html (14380 words)

	EX03 Cross Ionisation Ion Source-Thermo Scientific
		The EX03 is an electron impact source primarily designed for sample cleaning in surface analysis experiments and is intended for use with inert gas species.
		Direct gas input into the ion source allows for a lower system operating pressure than for guns requiring backfilling of the chamber.
		The excitation source is designed to give long filament lifetimes, with the service interval increased by the presence of two filaments.
	www.thermo.com /com/cda/product/detail/1,1055,15937,00.html (294 words)

	RF antenna ion source - Wikipedia, the free encyclopedia
		An RF antenna ion source or radio frequency antenna ion source is an internal multicusp design which can produce a particle beam of about ~30 to 40 mA beam current.
		The ion source section is located in the front end of the machine.
		With the development of the RF antenna ion source or non-thermionic ion source, this type of ion source has an advantage over conventional cold cathodes, and certainly hot filament ion sources.
	en.wikipedia.org /wiki/RF_antenna_ion_source (241 words)

	Technological ion and plasma sources
		These two kinds of ion sources are very simple and cheap in fabrication and may be used for solving of many technological problems.
		The PAEZA sources for technological applications are fabricated usually with circular beam output with diameter from 35 mm to 70 mm.
		We noted before that the main parameter of the ion source is not the pressure in a vacuum chamber but the gas consumption.
	home.earthlink.net /~chutko/ionsource.htm (2601 words)

	Oxford Scientific microwave plasma source. rf, plasma, source, microwave, ECR,plasma ion source, ion source, ECR ...
		This mode combines atom source and ion source behaviour to produce a source which behaves like the atom source at (1.) above until potentials are applied to the extraction grids when ions are then added to the beam.
		The highest current and energy beam produced using the dual grid is therefore ideal for sputter deposition work, especially where reactive gas ions are required because of the filamentless construction.
		For ion assisted deposition, the triple grid on the other hand, allows currents in excess of 50µA/cm2 to be achieved even at ion energies below 100eV.
	www.ion-source.com (1181 words)

	Ion Beam Scientific - Next Generation Ion Beam Technology, Gridless Ion Sources, Spare Parts and Consumables for ...
		We provide next generation ion beam technology, gridless ion sources, spare parts and consumables to research and industry worldwide.
		Two new ion sources have just been announced - the EH 400 compact gridless ion source and the EH 2000 high-output filamentless ion source.
		All of our new ion sources and power supplies are designed to be ‘drop-in’ replacements for Veeco-Commonwealth MKI and MKII gridless ion sources.
	www.ionbeam.co.uk (248 words)

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