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| | DTFLab ³í¹® |
 | | Doo Seok Jeong, Byung Joon Choi and Cheol Seong Hwang,"Study of the negative resistance phenomenon in transition metal oxide films from a statistical mechanics point of view", J. Appl. |
 | | Invited, Tae Joo Park, Jeong Hwan Kim, Jae Hyuck Jang, Minha Seo and Cheol Seong Hwang, ¡°Correlation between high-k properties and interfacial chemical structure of ALD HfO2 thin films on Si, Si1-xGex and Ge substrates¡±, 210th Electrochemical Society meeting, October 26 – November, 3 (2006) Moonpalace hotel, Cancun Mexico. |
 | | Jeong Hwan Kim, Tae Joo Park, Moon Ju Cho, Min Ha Seo, Jae Hyuck Jang, Cheol Seong Hwang, ¡° The Improvement In Dielectric Characteristics and Reliability of Atomic-Layer-Deposited HfO2 Thin Films by in-situ NH3 Injection¡±, poster, The Electrochemical Society 210th meeting, Moon Palace Resorts, Cancun, Mexico, Oct. 26 – Nov. 3, 2006 |
| 147.46.230.25 /cgi-bin/spboard/board.cgi?id=paper (402 words) |
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