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| | Patentee Index |
 | | Redl, Heinz; Schlag, Guenther; and Eibl, Johann 07091015 Cl. 435-183. |
 | | Benneker, Arno Herald; Brouwers, Johannes A. L.; and Van Dortmont, Godefridus M., to DSM IP Assets B.V. Process for the preparation of hydroxylammonium 07090817 Cl. 423-387. |
 | | Bonser, Douglas J.; Groschopf, Johannes F.; Dakshina-Murthy, Srikanteswara; Pellerin, John G.; and Cheek, Jon D., to Advanced Micro Devices, Inc. Method of reducing STI divot formation during semiconductor device fabrication 07091106 Cl. 438-424. |
| www.uspto.gov /web/patents/patog/week33/OG/patentee/alphaB.htm (10140 words) |
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