| |
| | Advanced Processing and Circuits Group - Publications (Site not responding. Last check: 2007-10-21) |
 | | A.T. Ping, Q. Chen, J. Wang, M. Khan, and I. Adesida, "The effect of reactive ion etching-induced damage on the characteristics of ohmic contacts to n-type GaN," J. Electron. |
 | | A.T. Ping, A. Schmitz, M. Asif Khan and I. Adesida, "Dry etching of GaN using chemically assisted on beam etching with HCl and H2/Cl2," J. Electron. |
 | | Ballegeer, K. Nummila, and I. Adesida, "A multilayer resist process for asymmetric gate recess in field-effect transistors," J. Vac. |
| www.ccsm.uiuc.edu /apc/publications.html (5742 words) |
|