| | Plasma processing apparatus using capacitance manometer and pressure control method thereof - Patent 5311452 |
 | | A plasma processing apparatus according to claim 1, wherein said capacitance manometer has a full scale of 0 to 1.0 Torr, and detects said predetermined first pressure on the order of several 10 m Torr which is substantially one tenth of said full scale of the capacitance manometer. |
 | | This pressure gage is, e.g., a capacitance manometer (tradename: Baratron) which is in principle a type of differential pressure gage and which has an anticorrosion property as described above, and outputs a linear output of, e.g., 0 to 10 V upon reception of a pressure of 0 to 1 Torr as a target. |
 | | If the capacitance manometer as described above is used as the pressure gage 10, the pump 48 is driven, the variable valve 60 is set to full-opening degree, and whether the interior of the vacuum-processing chamber 37 is set at 10.sup.-4 Torr is checked by the Pirani vacuum gage 66. |
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