| | NE Asia Online2005 Mar : Strained Si Enters Practical Use with Both nMOS, pMOS (Site not responding. Last check: ) |
 | | Strained Si technology requires that pMOS and nMOS channels are strained in different directions to improve the performance of both, and the resulting process complexity led most companies to only use the technology on one of the two types. |
 | | This approach has been frequently used in the past, especially to generate strain on the nMOS side, but the Si film growth parameters were tweaked to make it possible to apply the required compressive strain on the pMOS side as well. |
 | | Evaluation results were nMOS transistor drive performance at 1050µA/um for an off current of 70nA/um, superior to IBM's results of 940µA/um for an off current of 100nA/um. |
| neasia.nikkeibp.com /neasia/000509 (575 words) |