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| | Workshop Wroclaw 2001 |
 | | From the Federal Institute for Material Research and Testing, Berlin, Dr.H. Sturm examined nanolithography as a vital tool for structuring and analyzing polymer surfaces, showed striking visuals of "flowers" produced in Dynamic Plowing Lithography and discussed DPL vs. FDI Force Distance Indentation. |
 | | Danzebrink, PTB Physics and Technical Institute of Braunschweig, spoke on active and passive silicon probes for scanning near-field optical microscopy and SPM-based nanometrology, challenges in advanced SI technology, EU transfer standards for SPM, and new developments in focused ion beams, coated/uncoated silicon probes, and low temperature SNOM. |
 | | Grabiec, Institute for Electron Technology, Warsaw, covered the broad array of studies and interdisciplinary applications of microprobe and nanoprobe technological issues undertaken in his laboratory, including silicon research and development, sensors, tips, MRI issues, cantilevers, and thin films. |
| www.triple-o.de /pages/Wroclaw.html (476 words) |
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