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Topic: Photomask

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	Photomasks / Photomask Manufacturers
		Photomasks are the master tooling used by chip manufacturers and other industries to optically transfer patterns onto wafers and other substrates.
		Photomask plates are made of high-purity quartz, borofloat or sodalime glass that has been polished to micron flat tolerances.
		This photomask blank is then exposed to high intensity light or electron beams that expose a precise pattern into the photoresist on the photomask blank.
	www.martinphotomask.com /what_is.html (357 words)

	United States Patent Application: 0040091797
		A method for manufacturing a photomask in which a light transmitting pattern portion and a light shielding pattern portion are arranged for forming a predetermined optical image pattern on the surface.
		The photomask pattern area ratio C represents the ratio of the area of the light transmitting pattern portion (light shielding pattern portion) in the photomask to the area Am of the photomask.
		Therefore, in the case where the process conditions are made common by using the particular photomask, it is possible to obtain the function f common with the layout pattern having a difference in density such as the logic device and the memory-mixed device in addition to the memory device.
	appft1.uspto.gov /netacgi/nph-Parser?Sect1=PTO1&Sect2=HITOFF&d=PG01&p=1&u=/netahtml/PTO/srchnum.html&r=1&f=G&l=50&s1="20040091797".PGNR.&OS=DN/20040091797&RS=DN/20040091797 (3812 words)

	Photomask Creation (Site not responding. Last check: 2007-10-21)
		Photomasks are an integral component in the lithographic process of semiconductor manufacturing.
		The photomask is used as a “master” by chipmakers to optically transfer these images onto semiconductor wafers.
		Once final inspection is passed, the photomask is sent to the wafer fabrication facility (or “fab”) where it is used as a template or master image to repeatedly expose the pattern on wafers.
	www.xinitiative.org /Default.aspx?tabid=39 (537 words)

	Photomask blank and photomask - Patent 4720442
		The photomask blank according to claim 1, wherein the antireflection layer is formed on the transparent substrate and beneath the chromium masking layer, and another antireflection layer is formed on the chromium masking layer.
		The photomask according to claim 7, wherein the antireflection layer is formed on the transparent substrate and beneath the chromium masking layer, and another antireflection layer is formed on the chromium masking layer.
		Photomask blanks and photomasks having particularly excellent chemical resistance can be obtained by adjusting the nitrogen content in each of the layers formed on the substrate to a level of from more than 25 to 50% by atomic ratio.
	www.freepatentsonline.com /4720442.html (3970 words)

	[No title] (Site not responding. Last check: 2007-10-21)
		The entire photomask field may be projected in a single flash while the photomask plane and the wafer plane are stationary relative to one another.
		Photomask stage 14 is occupied by a photomask 16.
		When lens 20 reduces the size of the pattern of photomask 16 projected onto photoresist 24, the area of the pattern projected onto photoresist 24 is typically less than the area of semiconductor substrate 22 where patterns of photomask 16 are desired.
	www.wipo.int /cgi-pct/guest/getbykey5?KEY=01/51993.010719&ELEMENT_SET=DECL (5377 words)

	[No title] (Site not responding. Last check: 2007-10-21)
		In accordance with another embodiment of the invention, a method for manufacturing a photomask, includes: forming a photoresist layer overlying a transparent substrate; patterning the photoresist layer to create a photoresist pattern; and hardening the photoresist pattern for use as a permanent part of the photomask.
		Photomask 200 may not benefit from some of current photomask repair techniques since current techniques are optimized for chrome photomask, not masks including photoresist.
		A photomask comprising: a transparent substrate; a conductive pattern overlying the transparent substrate; and a hardened photoresist pattern overlying the conductive pattern.
	www.wipo.int /cgi-pct/guest/getbykey5?KEY=01/25855.010412&ELEMENT_SET=DECL (3577 words)

	United States Patent Application: 0040054982
		Photomasks are quartz or glass plates that contain precision images of layers of integrated circuits.
		The photomask specifications might be in hardcopy form or in electronic form, on some sort of physical media delivered to the manufacturer, or delivered electronically.
		The method occurs "on-line", in the sense that photomask specification data is received and processed using electronic transfers of the data.
	appft1.uspto.gov /netacgi/nph-Parser?Sect1=PTO1&Sect2=HITOFF&d=PG01&p=1&u=/netahtml/PTO/srchnum.html&r=1&f=G&l=50&s1="20040054982".PGNR.&OS=DN/20040054982&RS=DN/20040054982 (4052 words)

	Phase-shift photomask manufacturing method and phase-shift photomask - US Patent 6627359 (Site not responding. Last check: 2007-10-21)
		A phase-shift photomask according to claim 8, wherein said phase-shift photomask is a photomask suitable for a KrF eximer laser having an exposure light wavelength λ of 248 nm.
		In such photomask, it is difficult to pile, with high performance, the phase-shift photomask having the same refraction factor as that of the substrate, and there is a possibility of occurrence of a further problem of multipath refraction at the phase shift film 330.
		In such photomask, an amount of light transmitting through the etched portion is reduced in comparison with that transmitting through a non-etched portion, and resist patterns of projection images corresponding to the etched portion and the non-etched portion have dimensions different from each other.
	www.patentstorm.us /patents/6627359.html (4329 words)

	Pellicle/Photomask Particle Inspection System "PEGSIS P100" < Topics \| Lasertec Corporation
		Photomask is always required to maintain its high quality due to the fact that photomask is the original plate of circuit patterns for semiconductor devices.
		In concert with the shrinkage of semiconductor device patterns, the demand for higher quality of photomask is becoming stronger and stronger, and similarly the demand for higher defect inspection ability of inspection tools that gives confirmation and assurance of photomask quality is stronger and stronger.
		However, regarding the photomask inspection at wafer fabs, it is a fact that photomask is inspected by either naked eyes or by particle inspection tools that are installed in steppers with only 15um to 30um sensitivity.
	www.lasertec.co.jp /en/topics/2005/1125.html (577 words)

	PHOTRONICS INC (Form: 10-K, Received: 01/28/2004 06:02:03)
		Photomasks are a key element in the manufacture of semiconductors and are used as masters to transfer circuit patterns onto semiconductor wafers during the fabrication of integrated circuits and, to a lesser extent, other types of electrical components.
		Photomasks are manufactured in temperature, humidity and particulate controlled clean rooms because of the high level of precision, quality and yields required.
		Additionally, demand for photomasks has been, and could in the future be adversely affected by changes in methods of semiconductor manufacturing (which could affect the type or quantity of photomasks utilized), such as changes in semiconductor demand that favor field programmable gate arrays and other semiconductor designs that replace application specific integrated circuits.
	www.shareholder.com /photronics/ir/EdgarDetail.cfm?CIK=810136&FID=810136-04-2&SID=04-00 (5779 words)

	Photomask and pattern forming method employing the same - Patent 5851703
		The present invention relates to a photomask which is used to manufacture a semiconductor device and the like, and more particularly to a photomask which has been subjected to a processing of shifting a phase of exposure light beams and a pattern forming method employing the same.
		Therefore, since the present photomask is made up of only semitransparent phase shifting portions and transparent portions, there is no need to newly form a light shielding film for the formation of the light shielding portion, and thus, the process of forming the photomask can be simplified.
		It is, of course, to be understood that the combination is applicable to the necessary portions such as a window pattern for aligning the mask position, a pattern for detecting the wafer position, and a semitransparent phase shifting portion having a large area, all of which require a light shielding portion.
	www.freepatentsonline.com /5851703.html (4357 words)

	Solid State Technology - The photomask industry: Minimizing a crisis in escalating costs
		Although they have depended on their foundry partners for photomask services, many of these companies are small design teams without the financial resources to warrant iteration after iteration of designs that require the respinning of expensive photomask sets.
		Captive photomask houses are abandoning complete photomask development in favor of a cooperative model for high-end masks designed to speed up development cycles and reduce costs.
		Photomask demand is principally driven by new design activity, which is gaining momentum in all regions.
	sst.pennnet.com /Articles/Article_Display.cfm?Article_ID=150755&CFID=922601&CFTOKEN=89873156 (1488 words)

	Photomask and photomask blank - Patent 5597667
		The present invention relates to a photomask used in photolithography which is one of the processes of manufacturing a semiconductor integrated circuit, and more particularly, to a photomask which can contribute to the improvement of process latitude in photolithography.
		In the photomask provided by the present invention, illumination light is directed through one main surface having concaves and convexes to a light-shielding pattern on the other main surface.
		1, a photomask in accordance with one embodiment of the present invention is schematically illustrated in a cross section.
	www.freepatentsonline.com /5597667.html (3093 words)

	Press Releases
		Our ability to provide high-end photomask technology and world-class levels of service to a geographically diverse customer base depends on maintaining a state-of-the-art photomask manufacturing network with strategically located facilities in important regions of semiconductor manufacturing activity." He added, "Globalization is an important part of our continuous investment strategy.
		Photomasks are high precision quartz plates that contain microscopic images of electronic circuits.
		A key element in the manufacture of semiconductors, photomasks are used to transfer circuit patterns onto semiconductor wafers during the fabrication of integrated circuits.
	www.photronics.com /templates/pressreleases/1996/pr9603_ns.htm (593 words)

	Loss of 50 Percent Of U.S. Commercial PhotoMask Industry Raises National Security Alert
		The U.S. photomask industry has launched a new research and development consortium, but it might be too little, too late as the beleaguered industry is failing under competitive assault.
		The loss of DuPont Photomasks as a U.S. entity is raising concern in the Washington national security community because photomasks are essential in creating all semiconductor chips.
		The photomask is the only area in the semiconductor fabrication process where raw data is handled for laying down a complex pattern for circuitry.
	www.manufacturingnews.com /news/04/1217/art1.html (1697 words)

	Compugraphics photomask solutions
		Photomasks are the templates of how we live our lives today.
		A photomask provides the template for a semiconductor, the ubiquitous element in almost all modern electronics.
		This wafer is the 'foundation' of a semiconductor and it is coated in a photo-sensitive material that reacts to the light shone through the photomask.
	www.cgi.co.uk /whatmake_photomask.htm (186 words)

	Method of manufacturing photomask - Patent 5254418
		A method of manufacturing a photomask, according to the present invention, comprises the step of entirely forming an intermediate shifter on a transparent substrate, light shielding layers and a phase shifter such that the thickness of the intermediate shifter successively varies.
		The photomask 100a comprises a transparent substrate 11 and a plurality of light shielding layers 12 formed on the transparent substrate 11.
		The light entering the photomask 100a is partially transmitted in uncoated regions where the light shielding layer 12 is not provided.
	www.freepatentsonline.com /5254418.html (2040 words)

	AVI: Subwavelength Optical Linewidth Measurement
		In photomask metrology what we want to know is how much light will get to the photoresist when the mask is in the stepper.
		Optical linewidth measurements from the AVI Photomask Metrology System are shown to be accurate to 5 nm on lines down to 0.25 μ.
		The standard photomask metrology requirements can be performed with high accuracy and repeatability using the flux-area technique as implemented on the AVI Photomask Metrology System.
	www.aviphotomask.com /PMJ2000.htm (2435 words)

	Microlithography World - Photomask pattern generation strategies
		Photomask producers are beginning to work more closely with users to create a production strategy delivering maximum performance at reduced cost.
		Despite the increased value embedded in very advanced photomasks, segments of the semiconductor industry, most notably ASIC manufacturers, are finding it difficult to absorb these costs with their relatively small wafer runs.
		All of these studies suggest that with the proper modeling of the laser-made photomask, appropriate design and OPC corrections can be applied to the layout to achieve a desired wafer-level result as well as a similar process latitude to a given baseline process.
	sst.pennnet.com /Articles/Article_Display.cfm?Article_ID=176920&pc=gls (2154 words)

	Micro Lithography, Inc.
		It is a thin film stretched on a frame used to protect a photomask from particle contamination.
		Once a pellicle is properly attached on the photomask, the surface that is covered by the pellicle is free from future outside particle contamination.
		Now only a brief inspection of the pellicle film and photomask surface is required to insure the quality of the photomask.
	www.mliusa.com /pellicle.htm (654 words)

	Nanomachining, a new option for repairing Photomasks - Ravellc.com
		The RAVE nm1300 system is a high precision system for subtractive removal of opaque mask defects.
		Since it is very difficult to produce high-end reticles which are directly defect free, repair technology is becoming more and more important with decreasing feature size and increasing mask complexity.
		In the past, there were only two options for photomask repair: Focused ion beam (FIB), or laser.
	www.ravellc.com /products_photomask.html (600 words)

	Asahi Glass Succeeds in Development and Mass-Production of Synthetic Quartz Photomask Substrate (QC-i) for ArF Liquid ...
		Asahi Glass in 1999 developed photomask substrate and pellicle materials for F2 lasers, and is currently developing photomask materials for EUV lasers jointly with International Sematech of the U.S. (Headquarters: Austin, Texas).
		A copy of the photomask pattern forms on the mask blank, which is a substrate for the fabrication of photomasks.
		In the exposing process to transfer photomask patterns to wafers, polarization of the light source improves the contrast when resist materials are exposed, enabling an easier transfer of finer patterns to the wafers.
	www.prnewswire.com /cgi-bin/stories.pl?ACCT=104&STORY=/www/story/06-23-2004/0002198294&EDATE= (918 words)

	Mask work - Wikipedia, the free encyclopedia
		By extension, it also refers to the intellectual property right conferring time-limited exclusivity to a particular layout.
		The layout is called a mask work because, in photolithographic processes, actual ICs are created from a mask, called the photomask.
		Mask work exclusive rights were first granted in the US by the Semiconductor Chip Protection Act of 1984.
	en.wikipedia.org /wiki/Mask_work (746 words)

	The Korea Times : US Firm to Build Photomask Plant (Site not responding. Last check: 2007-10-21)
		The $300 million plant will be located in Cheonan, about 90 kilometers south of Seoul, and is to start production of photomasks during the first half of next year, it said.
		A photomask is a major component in designing circuitry on semiconductors and liquid crystal display (LCD) panels.
		The local photomask market is mainly driven by South Korean companies such as LG Micron and PKL.
	times.hankooki.com /lpage/biz/200601/kt2006011020253111910.htm (152 words)

	Legal Information
		Martin Photomask Services reserves the right to change these rules and regulations from time to time at its sole discretion.
		In the case of any violation of these rules and regulations, Martin Photomask Services reserves the right to seek all remedies available by law and in equity for such violations.
		Users are not permitted to use these Marks without the prior written consent of Martin Photomask Services or the third party who owns the Mark.
	www.martinphotomask.com /legal.html (323 words)

	Toppan Photomasks, Inc.
		The acquisition was approved by shareholders of DuPont Photomasks on March 28, 2005.
		Toppan Photomasks was formed in 2005, when Toppan Printing Co., Ltd. acquired DuPont Photomasks, Inc. The combination of Toppan Photomasks with the photomask business of Toppan Printing forms the world's premier photomask provider.
		Based in Round Rock, Texas, Toppan Photomasks offers a comprehensive range of photomask technologies, and research and development capabilities, as well as the most advanced and largest network of manufacturing facilities in the industry.
	www.photomask.com /news/recent_news/050422_acq_complete.html (555 words)

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