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Topic: Plasma ashing

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 Plasma   (Site not responding. Last check: 2007-10-29)
A plasma is also generated in front of a spacecraft 's heat shield on reentering the atmosphere.
In astrophysical plasmas, Debye screening prevents electric fields from affecting the plasma very much, but the existence of charged particles causes the plasma to generate and be affected by magnetic field s.
The dynamics of plasmas interacting with external and self-generated magnetic fields are studied in the academic discipline of magnetohydrodynamics.
www.serebella.com /encyclopedia/article-Plasma.html   (891 words)

 Plasma ashing process - US Patent 6630406   (Site not responding. Last check: 2007-10-29)
ashing the photoresist mask, the polymers and the residues from the substrate with a plasma generated from a gas mixture consisting of hydrogen, helium and tetrafluoromethane to selectively remove the mask and residues from the substrate.
The plasma ashing process according to claim 31, further comprising rinsing the substrate subsequent to ashing the photoresist from the substrate, wherein a critical dimension of the image in the substrate essentially does not change during rinsing.
Ashing is a plasma mediated stripping process by which photoresist, polymer and/or residues are stripped or removed from a substrate upon exposure to the plasma.
www.patentstorm.us /patents/6630406.html   (6228 words)

 Plasma ashing method - Patent 5294292
A plasma ashing method according to claim 1, wherein oxygen gas as the plasma ashing gas is kept at 1 Torr in the step for filling the plasma ashing gas in the chamber.
The high-frequency electric power used in the plasma ashing method of the invention is supplied under the condition of 0.10 [W/cm.sup.2 ] or less for the chamber or the unit area of the internal wall of the chamber.
A plasma ashing apparatus used in the embodiment is the same apparatus used in the description of the prior art.
www.freepatentsonline.com /5294292.html   (2162 words)

 Plasma ashing method and apparatus therefor - Patent 5226056
In a method for plasma ashing a resist film coated on a substrate, the temperature of the substrate is controlled initially at temperatures below that at which explosion of the resist film occurs until a surface portion of a resist film has been removed.
A plasma ashing apparatus according to claim 6 further comprising: a thermometer in association with said vacuum treatment chamber to measure a temperature of the surface of the substrate through the large diameter hole in the shower plate.
The ions in the plasma are moved by the attraction of the electric potential of the substrate and strike the front surface of the substrate.
www.freepatentsonline.com /5226056.html   (7598 words)

In physics and chemistry, plasma (also called an ionized gas) is an energetic state of matter in which some or all of the electrons in the outer atomic orbitals have become separated from the atom.
Commonly encountered forms of plasma include the Sun and other stars (which are plasmas heated by nuclear fusion), lit fluorescent lamps, lightning, the Aurora borealis, the solar wind, and interstellar nebulae.
A plasma is also generated in front of a spacecraft's heat shield on reentering the atmosphere.
www.fact-library.com /plasma.html   (438 words)

 Talk:Plasma ashing - Wikipedia, the free encyclopedia
"Plasma Ashing" and "Fluorine" does not really fit together, although the reaction with fluorine is often an oxidation reaction.
In fact, fluorine itself and fluorine atoms originating from fluorine containing precursors are broadly used for "Plasma Etching" / "Thermal Ething" e.g.
Furthermore, the use of "Plasma Ashing " is not limited to resist removal in semiconductors.
www.wikipedia.org /wiki/Talk:Plasma_ashing   (137 words)

 Microwave dry ashing - plasma processor 200-G   (Site not responding. Last check: 2007-10-29)
Plasma processes are being successfully used in many analytical laboratories, having become a standard preparation technique.
A gas dischaarge so-called plasma, is created, generating the charged ions and electrons, as well as neutral radicals and UV radiation required for the process.
The danger of the ashes being blown by the gas or air flow, as it occurred in previous machines, has been effectively eliminated in the more recent designs by the use of the so-called soft start valve flaps in the vacuum piping and adjustable flow valves for venting.
www.orbitech.co.uk /tepla200g.html   (810 words)

 [No title]   (Site not responding. Last check: 2007-10-29)
Reactor of plasma ashing of photoresist with thermostabilized substrate holder in temperature range from 60 to 300
This automatic plasma etcher is designed for etching thin films of silicone dioxide, phosphorussilicate glass (PSG), polysilicon and silicone nitride through photoresistive masks with high rate, uniformity and precision in LSI manufacture.
This automatic plasma etcher is designed for etching thin films of aluminum (aluminum/silicon alloys) through photoresistive masks and subsequent photoresist mask removal in two different reactors without intermediate overload in LSI manufacture.
www.vniipm.ru /ENG/plasma.html   (285 words)

 Quorum Technologies UK - PT7160 Plasma Barrel Reactor
The PT7160 plasma barrel reactor is designed to meet the requirements of research, development and small-scale production for a wide and varied range of plasma etching, plasma ashing and plasma cleaning applications.
Barrel systems plasma etch or plasma ash isotropically (in all directions) and are suitable for the majority of applications.
RF plasma excitation (for a period pre-set by the timer) is initiated.
www.quorumtech.com /Products/pt7160-plasma-reactor.htm   (935 words)

 Plasma Chemistry Applied to Electron Microscopy   (Site not responding. Last check: 2007-10-29)
Using replica EM and Oxygen ashing it was shown that latex particles of Polyalkylacrylates and Alkylacrylate-Methacrylic Acid Copolymers are aggregates of primary globules, the size of the globules depends upon the polymer.
Plasma ashed coal samples and Wandering Jew leaf observed using SEM and EDS showed 3-5 fold improvement in detection levels for Sulphur and Iron and also revealed particulates not previously observed.
Plasma incineration used to determine the morphological localization of structure bound mineral and metallic elements within biological cells at TEM levels.
www.ebsciences.com /papers/plasma_em.htm   (1000 words)

 Plasma ashing -- Facts, Info, and Encyclopedia article   (Site not responding. Last check: 2007-10-29)
Using a (Colorless watery fluid of blood and lymph containing no cells and in which erythrocytes and leukocytes and platelets are suspended) plasma source, a monatomic reactive (Coins collectively) specie is generated.
The reactive specie combines with the photoresist to form ash which is removed with a (A pump that moves air in or out of something) vacuum pump.
To some extent, these longer process times can be mitigated by increasing the temperature of the reaction area.
www.absoluteastronomy.com /encyclopedia/p/pl/plasma_ashing.htm   (307 words)

 Plasma Prep™ II Plasma Etcher - SPI Supplies
So a coal sample, for example, that is "ashed" is one where all of the organics have been etched away and all that remains are the inorganics.
If you want to have the Plasma Prep II configured for 10 watt operation, the price is the same, just be sure to let us know when you place your order that you want the 10 watt configuration for plasma cleaning.
Note that the SPI Plasma Prep II has been manufactured with materials that are fully compatible for use with CF This is not the case for many of the other units on the market that are compatible only with oxygen, nitrogen and argon.
www.2spi.com /catalog/instruments/etchers1.shtml   (1697 words)

 Plasma ashing   (Site not responding. Last check: 2007-10-29)
In semiconductor manufacturing plasma ashing is theprocess of removing the photoresist from an etched wafer.
The reactive specie combines with thephotoresist to form ash which is removed with a vacuum pump.
Originally, plasma was generated in the process chamber, but as the need to get rid of freeradicals has increased, many machines now use a downstream plasma configuration, where plasma is formed remotely and channeled to the wafer.
www.therfcc.org /plasma-ashing-148598.html   (245 words)

 Low-Temperature Decomposition of Botanical and Biological Samples for Multielement Analysis by High-Frequency Induced ...   (Site not responding. Last check: 2007-10-29)
After sample decomposition within an 02—Ar—F plasma, the ashing residues and the elements condensed on the surface of the vessel or cooling finger are dissolved by refluxing in 1—5 mL of double-distilled acid.
The time required to ash 1.0 g of botanical sample in the CPA was reduced from 80 h with no ashing aids to 3 h wiht maximum ashing aids.
The optimum plasma ashing conditions for 1.0 g of sample was 6 h at a high-frequency power of 30 W with a 1 h acid reflux to dissolve sample ash.
www.aoac.org /pubs/JOURNAL/1995/Low_Temperature.htm   (292 words)

 plasma cleaner, plasma asher, plasma etcher, plasma surface modification, plasmacleaning
plasma cleaner, plasma asher, plasma etcher, plasma surface modification, plasmacleaning
Plasma treatment will improve polymer analysis, wetability problems, painting/coating of plastics, gluing results and clean surfaces from carbon, grease and oil.
Plasma cleaner, plasma etcher, plasma etcher, plasma surface modification, plasma and polymer analysis, plasma coater - all in one instrument.
www.plasmainstrument.com   (421 words)

 Plasma physics   (Site not responding. Last check: 2007-10-29)
In physics and chemistry, a plasma is an ionized gas, and is usually considered to be a distinct phase of matter.
The free charges make the plasma electrically conductive so that it couples strongly to electromagnetic fields.
This fourth state of matter was first identified by Sir William Crookes in 1879 and dubbed "plasma" by Irving Langmuir in 1928.
www.kiwipedia.com /en/plasma-physics.html   (148 words)

 plasma - definition of plasma by the Free Online Dictionary, Thesaurus and Encyclopedia.   (Site not responding. Last check: 2007-10-29)
plasma - colorless watery fluid of blood and lymph containing no cells and in which erythrocytes and leukocytes and platelets are suspended
gamma globulin, human gamma globulin - a plasma protein containing the immunoglobulins that are responsible for immune responses
This information should not be considered complete, up to date, and is not intended to be used in place of a visit, consultation, or advice of a legal, medical, or any other professional.
dict.thefreelibrary.com /Plasma   (352 words)

 Pre-treatment of low-k dielectric for prevention of photoresist poisoning - US Patent 6534397   (Site not responding. Last check: 2007-10-29)
Deleterious poisoning of patterned photoresist masking layers accompanying plasma ashing/etching of photoresist and/or low-k dielectric layers is eliminated, or at least substantially reduced, by pretreating exposed surfaces of the low-k dielectric layer(s) with hydrogen, e.g., by contact with a hydrogen plasma prior to plasma ashing/etching.
In accordance with embodiments of the present invention, step (d) comprises anisotropic etching utilizing a reactive plasma; and step (i) comprises anisotropic etching utilizing a reactive plasma and terminating etching of the at least one second recess at the thin etch stop layer.
In the event a single low-k interlayer dielectric layer is employed in place of the illustrated laminate of low-k interlayer dielectric layers, a timed etch not requiring an etch stop layer may be utilized to form trench portion 23 extending only partway through the single low-k interlayer dielectric layer.
www.patentstorm.us /patents/6534397.html   (5104 words)

 Plasma Processing   (Site not responding. Last check: 2007-10-29)
Fundamental understanding of plasma processes is now sufficient that plasma models are emerging as tools for the developing new plasma equipment and processes, as well as, the diagnosing process difficulties.
In addition, plasma diagnostics are now being implemented as process monitors, end point detectors, and process controllers to improve processing flexibility and reliability.
Studied the ion-enhance surface kinetics that are responsible for directional plasma etching using beams to simulate the fluxes which impinge on the surfaces during processing.
plasma-processing.com   (4334 words)

 [mems-talk] Plasma ashing   (Site not responding. Last check: 2007-10-29)
Mike, With all plasma devices you introduce heat as the plasma gas is hot.
Try tests where you plasma clean for a fraction of the usual time, then introduce nitrogen back to atmosphere to cool the substrate.
Bill Moffat -----Original Message----- From: Mike Tippetts [mailto:mike.tippetts@pfe-ltd.com] Sent: Tuesday, March 26, 2002 6:52 AM To: 'mems-talk@memsnet.org' Subject: [mems-talk] Plasma ashing I am currently trying to commision a TePla 300 Plasma processor for the use in removing photoresist from devices after RIE but I am left with small residues which are impossible to remove.
mail.mems-exchange.org /pipermail/mems-talk/2002-March/006858.html   (232 words)

 Plasma Damage   (Site not responding. Last check: 2007-10-29)
When we talk about plasma damage, various issues can be considered, e.
plasma ashing by oxygen can increase the k value of the low k material, rendering its costly application useless.
But in most cases if we talk about plasma damage we think of degradation of devices like transistors or memory cells by non uniform charging and/or UV radiation during plasma processing.
www.gs68.de /tutorials/plasma/node26.html   (113 words)

 Plasma Ashing Encyclopedia Article, Definition, History, Biography   (Site not responding. Last check: 2007-10-29)
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www.karr.net /encyclopedia/Plasma_ashing   (439 words)

 Plasma Screen Reviews - cleaning plasma   (Site not responding. Last check: 2007-10-29)
In the plasma cleaning of metals, ceramics, and glass, contaminants are desorbed...
Plasma clean, plasma equipment, plasma systems, plasma machines, plasma etching, plasma desmear, plasma surface preparation,wire bonding, plasma desmear,...
Harrick Plasma Cleaner models are low-cost tabletop inductively coupled plasma devices that serve as excellent tools for surface cleaning,...
www.telegraphics.co.uk /cleaning_plasma.html   (178 words)

 Search Results for: plasma   (Site not responding. Last check: 2007-10-29)
University group in plasma physics reseach engaged both experimentally and theoretically in a number of research programmes including fundamental plasma physics, acceleration of particles using plasma waves and thermonuclear fusion.
Plasma and fusion theory, microwave discharges and technology, beam plasma and plasma diagnostics.
Aims to enhance the safety of human, blood source plasma and plasma derivatives by facilitating research into a universal method to eradicate pathogens, preferentially focusing on initial sterilization techniques.
www.footedgestage.com /stats/cobermuegge/kw-search-4204-M5.htm   (548 words)

 RF Plasma Cleaning
Evactron® RF plasma cleaner is an Electron microscope Decontaminator or Anticontaminator for removal of AMC(atmospheric molecular contamination), oils and other hydrocarbons.
A plasma asher for external mounting on vacuum chambers and electron microscopes.
Hydrocarbons are oxidized in low vacuum to H2O, CO, and CO2 molecules that are carried by convection to the roughing pump and exhausted from the chamber.
www.evactron.com   (365 words)

 Science Physics Plasma Companies
Applied Plasma Technologies - Company designs and manufactures plasma assisted combustion systems including plasma igniters, plasma pilots, plasma fuel nozzles and plasma fuel converters on the basis of thermal and non+thermal plasmatrons.
Plasma Antennas LTD - The company developing plasma antennas to meet large demands in civil and defence markets.
Plasma Surface Modification - A company located in Dresden, Germany, provides a wide range of plasma services, analysis and consulting.
www.offersonly.com /directory/Science-Physics-Plasma-Companies.html   (948 words)

 Chapter 7.11 - Technics C Plasma Etching System   (Site not responding. Last check: 2007-10-29)
Technics C is a plasma etching system used for descumming/ashing of photoresist and nitride etching.
This document describes the general operation of Technics C. Technics C Plasma Etcher is primarily for descumming and ashing photoresist.
Once flow into the chamber is stable and at the desired pressure, you can strike a plasma by switching the power toggle on and turning the dial clockwise until the desired power is reached.
microlab.eecs.berkeley.edu /labmanual/chap7/7.11.html   (1590 words)

 the knowledge.com ™ directory - science - physics - plasma - companies   (Site not responding. Last check: 2007-10-29)
Instruments for plasma cleaning, plasma etching, plasma ashing, plasma coating and plasma surface modification.
Harrick Scientific Corporation presents tabletop plasma devices for surface cleaning, surface preparation and surface modification of a wide variety of materials.
Company designs and manufactures plasma assisted combustion systems including plasma igniters, plasma pilots, plasma fuel nozzles and plasma fuel converters on the basis of thermal and non-thermal plasmatrons.
directory.knowledge.com /science/physics/plasma/companies   (805 words)

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