Factbites
 Where results make sense
About us   |   Why use us?   |   Reviews   |   PR   |   Contact us  

Topic: Plasma processing


Related Topics

  
  Plasma physics - Encyclopedia.WorldSearch   (Site not responding. Last check: 2007-10-19)
In physics and chemistry, plasma (also called an ionised gas) is an energetic gas-phase state of matter, often referred to as "the fourth state of matter", in which some or all of the electrons in the outer atomic orbitals have become separated from the atom or molecule.
Plasma physics is important in astrophysics in that many astronomical objects including stars, accretion disks, nebula, and the interstellar medium consist of plasma.
The dynamics of plasmas interacting with external and self-generated magnetic fields are studied in the academic discipline of magnetohydrodynamics.
encyclopedia.worldsearch.com /plasma_physics.htm   (1281 words)

  
 Plasma Science Report, 1995 (Contents and Overview)
The plasma medium is inherently nonlinear because the charged particles composing the plasma interact collectively with the electromagnetic fields produced self-consistently by the charge density and currents associated with the plasma particles.
A recent National Research Council report[1], which highlights the importance of plasma processing in the electronics industry, indicates that the worldwide sale of plasma reactors alone amounted to $1 billion dollars in 1990 and is expected to double in the next five years.
Examples of applications of nonneutral plasmas are electron beams and plasmas for the generation of electromagnetic waves, pure ion plasmas in traps for atomic clock applications, advanced concepts for particle accelerators, and the confinement of antimatter such as positrons and antiprotons.
www.nap.edu /readingroom/books/plasma/contents.html   (8807 words)

  
 Nat' Academies Press, Plasma Processing of Materials: Scientific Opportunities and Technological Challenges (1991)
Plasma processing of materials is also a critical technology in, for example, the aerospace, automotive, steel, biomedical, and toxic waste management industries (Figure 2.1).
Plasma science is the study of the nonlinear collective interactions of electrically charged particles with each other, with neutral atoms and molecules, and with electric and magnetic fields.
Thermal plasma processing applications range from physical transformation of materials such as bulk melting in metallurgical plasma furnaces, metal cutting and welding, or powder melting during spraying, to driving chemical reactions, as in the reduction of oxides, in the synthesis of ceramic powders or films, or in the destruction of hazardous chemical wastes.
www.nap.edu /books/0309045975/html/6.html   (3115 words)

  
 Plasma processing damage in etching and deposition
Plasma etching and deposition are basic tools in the fabrication of the large-area thin-film structures of macroelectronics and the submicron structures of microelectronics.
Processing flow and device and circuit layout very strongly influence the impact of the potential damage effects seen in Table 1.
Layouts causing large currents during plasma processing due to effective "antenna" charge collection from interconnects [1-3] or due to time-changing magnetic-field-induced EMFs in interconnect loops [7] are detrimental.
www.research.ibm.com /journal/rd/431/fonash.html   (1612 words)

  
 Plasma Article, Plasma Information   (Site not responding. Last check: 2007-10-19)
Plasmas are the most common form of matter, comprising morethan 99% of the known visible universe.
In astrophysical plasmas, Debye screening prevents electric fields from affecting the plasma very much, but theexistence of charged particles causes the plasma to generate and be affected by magnetic fields.
The dynamics of plasmas interactingwith external and self-generated magnetic fields are studied in the academic discipline of magnetohydrodynamics.
www.anoca.org /plasmas/matter/plasma.html   (547 words)

  
 Vacuum Plasma Processing
Because plasmas affect materials at an atomic level, it is often necessary to use surface analysis techniques such as scanning electron microscopy and X-ray photoelectron spectroscopy to identify the processes required and to judge their effects.
The plasma energy is highly efficient because the vacuum pressure reduces recombinations, and increases the mean free path length of the particles resulting in higher ionic kinetic energies.
Plasma technology has many advantages thermodynamically unfavourable reactions can be achieved at low temperatures, surfaces can be cleaned with no residues, and it eliminates the need to use primers and pretreatments for adhesion promotion.
www.azom.com /details.asp?ArticleID=912   (1270 words)

  
 ipedia.com: Plasma Article   (Site not responding. Last check: 2007-10-19)
The word plasma has a Greek root which means to be formed or molded and has a few definitions: in geology, a green type of chalcedony, in medicine, the fluid part of blood : see blood plasma, lymph or...
In physics and chemistry, plasma (also called an ionized gas) is an energetic state of matter in which some or all of the electrons in the outer atomic orbitals have become separated from the atom.
A cold plasma is one where only a small fraction of the atoms in a gas are ionized, and the electrons reach a very high temperature, whereas the ions remain at the ambient temperature.
www.ipedia.com /plasma.html   (568 words)

  
 ELEC 7730 - Advanced Plasma Processing for Microelectronic Fabrication   (Site not responding. Last check: 2007-10-19)
Plasma reactor design and process optimization, plasma assisted etching and deposition processes, plasma assisted oxidation and surface modification processes, plasma polymerization, plasma induced damages to semiconductor devices.
Plasma processing has been found to be one of the enabling techniques for the achievement of Very Large Scale Integrated Circuit (VLSI).
The design of plasma reactors and the processes, the characterization of the plasma being generated, and the analysis and optimization of the plasma processes for specific needs will be focus for students taking this course.
www.eng.auburn.edu /ee/semester/7730sylb.htm   (326 words)

  
 PLASMA APPLICATIONS LABORATORY
In particular, we have developed plasma diagnostics for semiconductor processing discharges and have extensive experience in determining plasma kinetics.
A pyrex tube plasma system for easy generation and diagnostics of plasmas at a large variety of pressures and and in a large variety of gas mixtures.
A pinhole aperture to the plasma allows direct plasma ion detection of either positive or negative ions, and neutrals can be detected by using the filaments.
www.utdallas.edu /~overzet/PALab.html   (1249 words)

  
 MSc Physics of Advanced Semiconductor Materials - lecture 1
Plasmas are often described as being the 4th state of matter, together with liquid, solid and gas.
To sustain the plasma, electrons must be generated at a rate which is large enough to offset the loss of electrons to the chamber walls, recombination with positive ions and/or electron attachment reactions.
One of the features of a plasma is that whilst the bulk of the glow discharge remains at equipotential, most of the voltage applied between the electrodes is dropped across a small region surrounding any surface in contact with the plasma, especially the electrodes.
www.chm.bris.ac.uk /~paulmay/misc/msc/msc1.htm   (2274 words)

  
 Dr. Hicks' Lab - Plasma Processing
Plasma reactors are used in approximately a third of all the process steps used to manufacture integrated circuits.
The plasma jet produces a large flux of atoms and/or radicals, depending on the gas fed to the device.
The plasma device shown in the picture is suitable for government research studies.
www.seas.ucla.edu /prosurf/plasmapro.htm   (581 words)

  
 PRINCIPLES OF PLASMA DISCHARGES AND MATERIALS PROCESSING Home Page   (Site not responding. Last check: 2007-10-19)
Plasma processing is a high-technology discipline born out of the need to access a parameter space in materials processing unattainable by strictly chemical methods.
Plasma-based surface processes are indispensable for manufacturing the integrated circuits used by the electronics industry, and we use thin-film processes drawn from this field as examples.
Plasma processing is also an important technology in the aerospace, automotive, steel, biomedical, and toxic waste management industries.
www.eecs.berkeley.edu /~lieber/Textbook2.html   (236 words)

  
 Plasma on the Internet
Laboratory of Plasma Chemistry at the University of Patras
Plasma Processing Laboratory at the University of Houston, TX
Plasma Processing Laboratory at the University of Idaho
plasma-gate.weizmann.ac.il /PlasmaI.html   (1654 words)

  
 Amazon.com: Principles of Plasma Discharges and Materials Processing: Books: Michael A. Lieberman,Allan J. Lichtenberg   (Site not responding. Last check: 2007-10-19)
A Thorough Update of the Industry Classic on Principles of Plasma Processing The first edition of Principles of Plasma Discharges and Materials Processing, published over a decade ago, was lauded for its complete treatment of both basic plasma physics and industrial plasma processing, quickly becoming the primary reference for students and professionals.
Along with in-depth coverage of the fundamentals of plasma physics and chemistry, the authors apply basic theory to plasma discharges, including calculations of plasma parameters and the scaling of plasma parameters with control parameters.
The plasma medium is complicated in that the charged particles are both affected by external electric and magnetic fields and contributes to them.
www.amazon.com /exec/obidos/tg/detail/-/0471005770?v=glance   (1169 words)

  
 March Plasma Systems - Plasma technology for semiconductor, wafer level packaging, PCB and medical device industries ...
March Plasma Systems, located in Concord, CA and St. Petersburg, FL, is a world leader in gas plasma technology for semiconductor, wafer level packaging, PCB and medical device industries.
Plasma treatment increases the surface energy of advanced materials, including Teflon®, providing excellent lamination and wettability for plating through-holes.
Plasma also removes resin smear created in the drilling process and removes carbon by-products from blind vias.
www.plasmod.com   (191 words)

  
 Plasma Processing   (Site not responding. Last check: 2007-10-19)
Fundamental understanding of plasma processes is now sufficient that plasma models are emerging as tools for the developing new plasma equipment and processes, as well as, the diagnosing process difficulties.
Studied the ion-enhance surface kinetics that are responsible for directional plasma etching using beams to simulate the fluxes which impinge on the surfaces during processing.
This unit is placed between the process and its pump and does not affect the plasma process.
plasma-processing.com   (4334 words)

  
 Research Areas   (Site not responding. Last check: 2007-10-19)
West Virginia University's experimental plasma research program has concentrated on fundamental problems of plasma behavior that are also relevant to the understanding of processes that occur naturally in space plasmas and in man-made fusion plasmas.
The helicon source is also used to generate the plasma in a large space simulation chamber in which experiments on collisionless magnetic reconnection and the effects of the space plasma environment on scientific spacecraft are performed.
In addition, the plasma physics group has ongoing projects involving studies of sheath formation in space-relevant plasmas, the analysis of data from scientific spacecraft (Ulysses and Pioneer Venus Orbiter), the development of neutral atom imaging diagnostics for fusion and space experiments, and the investigation of nonlinear processes in low-temperature, optically pumped, plasmas.
www.as.wvu.edu /phys/plasma.htm   (397 words)

  
 Monte Carlo Simulation   (Site not responding. Last check: 2007-10-19)
The ion-enhanced etching yield was a strong function of the neutral-to-ion flux ratio, and scaled linearly with the square root of the ion energy.
As feature dimensions shrink and the process windows narrow, a thorough understanding of the fundamental mechanisms which determine etching anisotropy is required to facilitate better process modeling, the next generation equipment design, and process development.
Chlorine-based plasma etching has been used in the semiconductor industry to achieve high fidelity pattern transfer in integrated-circuit fabrication processes, especially in polysilicon gate definition.
plasma-processing.com /plasma.htm   (4917 words)

  
 Plasma Home Page - Dow Corning   (Site not responding. Last check: 2007-10-19)
The use of plasma is a natural evolution in the extensive surface modification portfolio of Dow Corning.
The combination of Dow Corning’s atmospheric plasma processing, surface modification know-how, application experience and materials is bringing real results for customers.
Plasma’s excellent environmental profile, compared to conventional wet coatings, and its performance benefits are impacting many industry sectors.
www.dowcorning.com /content/plasma   (265 words)

  
 FCIPT : plasma processing in India and development of plasma based technologies for industries
The knowledge-base in plasma sciences and associated technologies is exploited to generate advanced and non conventional plasma based technologies for material processing and environmental remediation.
It is exclusively devoted to basic research in plasma sciences and development of technological applications.
The major thrust is in magnetic confinement fusion and plasma assisted material processing.
www.plasmaindia.com   (143 words)

  
 Surfx Technologies LLC
Our atmospheric plasma sources provide fast, safe and effective surface treatment of your materials at ambient pressure and near room temperature.
Low temperature, atmospheric plasmas are well suited for surface treatment of many different materials, including ceramics, polymers, fabric, wire, molded parts, powders, gels and biological materials.
Our plasmas combine an inert gas, helium or argon, with any other reactive gas, such as oxygen, nitrogen, hydrogen, methane, etc., so that you can effectively tackle any application.
surfxtechnologies.com   (176 words)

  
 ECE 528: Plasma Processing and Technology
Plasma processing of materials for semiconductors, polymers, plasma spray coatings, ion implantation, etching, arcs, extractive metallurgy and welding.
NEEP 528 is an introductory course on the use of plasmas in a variety of industrial settings.
It is an important course for students intending to make a career as applied plasma physicists, and provides knowledge in a fundamental area (plasma physics) for such students.
www.engr.wisc.edu /ece/courses/ece528.html   (457 words)

  
 The Plasma Theory and Simulation Group
Plasma bulk (fluids), plasma sheath (particles); bounding wall (profiler); an attempt to construct seamless boundaries at the fluid /particle/ wall boundaries, and to run at fluid code speeds
The P, C, and S mean planar, cylindrical, or spherical bounding electrodes; the 1 means 1d 3v and the 2 means 2d 3v.
The electrodes are connected by an external series R, L, C, source circuit, solved by Kirchhoff's laws simultaneously with the internal plasma solution (Poisson's equation), The source may be V(t) or I(t), may include a ramp-up (in time).
ptsg.eecs.berkeley.edu   (911 words)

  
 Surface Technology Systems - Plasma etch and deposition for MEMS, Optoelectronic, Compound Semiconductor, Wafer Level ...
Surface Technology Systems plc is a leading provider of specialist plasma etch and deposition systems to customers in the MEMS, Optoelectronic, Compound Semiconductor, Wafer Level Packaging and Thin Film Head industries.
MEMS (Micro Electro Mechanical Systems) is a rapidly growing market, within which STS etch and deposition technologies are ideally suited to provide high rate, deep silicon etching using DRIE, SOI etching, high aspect ratios, smooth vertical sidewalls, dry low-damage release etches and deposition of low stress films.
STS processes are used in innovative packaging solutions, e.g.
www.stsystems.com   (321 words)

  
 ISU Computational Optical and Discharge Physics Group
Mark J. Kushner, develops computer simulations of low temperature plasmas and technologically important devices which use low temperature plasmas.
These simulations are used as both a method of investigating the basic physical processes which occur in low temperature plasmas, and as Computer Aided Design (CAD) tools for the design of plasma equipment.
The CODPG is well known in the microelectronics fabrication industry for its innovative simulations and visualizations of plasma processing reactors, and for its close working relationships with the industry and with national laboratories.
uigelz.ece.iastate.edu   (331 words)

  
 Amazon.com: Handbook of Advanced Plasma Processing Techniques: Books   (Site not responding. Last check: 2007-10-19)
This volume covers the topic of advanced plasma processing techniques, from the fundamental physics of plasmas to diagnostics, modeling and applications such as etching and deposition for microelectronics.
The use of plasmas for patterning on a submicron scale has enabled successive generations of continually smaller transistors, lasers, micromachines, sensors and magnetic read/write heads that have formed the basis of our information age.
This volume is the first to give coverage to this broad area of topics in a detailed fashion, especially in the rapidly expanding fields of micro-mechanical machines, photomask fabrication, magnetic data storage and reactor modeling.
www.amazon.com /exec/obidos/tg/detail/-/3540667725?v=glance   (394 words)

  
 Plasmas and Fusion Technology
The University of Wisconsin - Madison is a world leader in plasmas and fusion technology, with experimental and theoretical programs in several departments.
A unique opportunity is afforded for individual research as well as cross-disciplinary collaboration.
Research includes toroidal magnetic confinement, electrostatic confinement, plasma sources, magnetohydrodynamics, microturbulence, high-frequency heating, free electron sources of millimeter waves, waves and instabilities, space plasmas, numerical simulation, kinetic theory, turbulence and transport, microwave diagnostics and devices, spectroscopic diagnostics, laser-plasma interactions, and fusion reactor engineering studies.
sprott.physics.wisc.edu /fusion.htm   (301 words)

  
 4th STATE - Technical Publications
Modification of Polymeric Material Surfaces with Plasmas, Don M. Coates and Stephen L. Kaplan, Plasma Processing of Advanced Materials, MRS Bulletin, August 1996
Plasma Processes and Adhesive Bonding of Polytetrafluoroethylene, S.L. Kaplan, E.S. Lopata and J. Smith,
Commercial Plasma Processes For Enhanced Paintability of TPO Auto Fascia, Stephen L. Kaplan, Peter W. Rose, Sorlien, Per Harald, and Styrmo, Odd
www.4thstate.com /techpubs.htm   (400 words)

Try your search on: Qwika (all wikis)

Factbites
  About us   |   Why use us?   |   Reviews   |   Press   |   Contact us  
Copyright © 2005-2007 www.factbites.com Usage implies agreement with terms.