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Topic: Positive resist

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Photoresist

Photolithography

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	iBridge Network \| Positive Tone Resists Developed with CO2/Water Systems
		A positive resist is a type of photoresist in which the portion of the photoresist that is exposed to light becomes soluble to the photoresist developer and the portion of the photoresist that is unexposed remains insoluble to the photoresist developer.
		A negative resist is simply the opposite of a positive resist; that is, the exposed portion becomes insoluble and the unexposed portion becomes soluble.
		The neutral to acidic water-rich phase is used to remove a portion of the polymer used as a resist that was not exposed to light.
	www.ibridgenetwork.org /unc/positive_tone_resists_developed_with_co2_water_systems (0 words)

	Positive Resist On GlobalSpec
		Positive displacement flow meters measure the volume or flow rate of a moving fluid or gas by dividing the media into fixed, metered volumes.
		positive resist resist which is initially insoluble in the developer and becomes soluble as a result of irradiation; chain scission takes place in the resist structure during irradiation; allows...
		The Valcor solenoid operated metering pumps are positive displacement devices where the effects of fluid pressure, density and viscosity are minimized, as the flow rate is almost entirely dependent on the volume displaced by the piston during each stroke and on the number of strokes per unit time.
	industrial-computers.globalspec.com /Industrial-Directory/positive_resist (1336 words)

	Positive resist composition containing 1,2-quinone diazide compound, alkali-soluble resin and polyhydroxy phenol ... (Site not responding. Last check: )
		The radiation-sensitive positive resist composition according to claim 1, wherein R is a hydrogen atom, a C.sub.1 -C.sub.3 alkyl group or a phenyl group, and R' is a C.sub.1 -C.sub.5 alkyl group or an alkoxy group.
		The radiation-sensitive positive resist composition according to claim 1, wherein said alkali-soluble resin is a novolak resin which is characterized in that an area ratio in GPC of a range in which the molecular weight as converted to polystyrene is not larger than 900 does not exceed 25%.
		The positive resist composition of the present invention is prepared by mixing and dissolving the radiation-sensitive component, the alkali-soluble resin and the phenol compound (I) in a solvent.
	www.freepatentsonline.com /5188920.html (2718 words)

	Photoresist - Wikipedia, the free encyclopedia
		A positive resist is a type of photoresist in which the portion of the photoresist that is exposed to light becomes soluble to the photoresist developer and the portion of the photoresist that is unexposed remains insoluble to the photoresist developer.
		A negative resist is a type of photoresist in which the portion of the photoresist that is exposed to light becomes relatively insoluble to the photoresist developer.
		One very common positive photoresist used with the I, G and H-lines from a mercury-vapor lamp is based on a mixture of Diazonaphthoquinone (DNQ) and Novolac resin (a phenol formaldehyde resin).
	en.wikipedia.org /wiki/Photoresist (790 words)

	Transene - PhotoResist Materials - Positive Resist Removers
		Positive Resist Remover PRR-001 is composed of a proprietary mixture of water miscible and biodegradable ingredients.
		PRR-001 is formulated to remove (dissolve) all the common positive working photoresists baked onto various substrates (ex: gallium aresenide, silicon, chrome) and is non-corrosive to various metal and oxide surfaces under proper usage.
		Positive Resist Remover PRR-002 is composed of a proprietary mixture of water miscible and biodegradable ingredients.
	www.transene.com /pos_re1.html (410 words)

	IBM Research \| Almaden Research Center \| Science and Technology \| Lithography
		The resist is illuminated by a radiation source (often a monochromatic light source from a laser) in a patternwise fashion -- typically using a mask containing clear and opaque regions) and then usually baked.
		But where the resist had been removed, exposing the substrate, the etching process removes material from the substrate, in the case copper that will not be part of the eventual circuit's wiring -- in our printed circuit board example, conducting wires atop the exposy insulator.
		Revolutionary advances in resist materials are one of the key reasons why the semiconductor industry has been able to print progressively smaller features that have resulted in the explosion of evermore dense/powerful/cheaper chips that enable a host of fantastic applications, from supercomputers to singing greeting cards.
	www.almaden.ibm.com /st/chemistry/lithography/index.shtml (452 words)

	Polymeric materials have found use in the electronics industry in both manufacturing process used to generate today’s ...
		Positive resist are different from negative resist in response to actinic light and the resulting image, although the essential composition is similar; each contain sensitizes, resin, solve nts, and additives.
		Positive -acting photoresist is applied uniformly in a thin layer on the circuit board or other base material and dried thoroughly.
		Positive resists are largely used for the patterning of high-resolution semiconductor device, although advances in the resolution capability of some negative systems, and the advantage of patterning them on certain device levels have generated increased interest and usage.
	www.eng.buffalo.edu /Courses/ce435/Polymers/Photoresist.html (2969 words)

	Negative photoresists for optical lithography
		For these reasons, positive diazo-type resists have been the backbone of the industry, and innovative chemistry was able to extend their use for a number of manufacturing applications that might otherwise have required the development of new negative resists.
		This is very difficult to achieve in positive resists, because the optical exposure dose (and hence the development rate of the system) is greater at the surface than at the resist/substrate interface, resulting in the profile seen in Figure 3(a).
		This is due both to the wider processing latitude of the resist and to the ability to pattern this critical level using a dark-field mask to reduce scattered light reflections in the optical exposure tool lens and in the resist film itself.
	www.research.ibm.com /journal/rd/411/shaw.html (5117 words)

	Lithography
		When resist is exposed to a radiation source of a specific a wavelength, the chemical resistance of the resist to developer solution changes.
		If the resist is placed in a developer solution after selective exposure to a light source, it will etch away one of the two regions (exposed or unexposed).
		If we are using positive photoresist, this will result in the photoresist image being eroded along the edges, resulting in a decrease in feature size and a loss of sharpness or corners (as shown in figure 9).
	www.memsnet.org /mems/processes/lithography.html (1995 words)

	NanoMaker: Investigation of Structure Profiles in Negative Resists (Site not responding. Last check: )
		But, it is well known [4], that in the case of positive resists the resist depth exposure nonuniformity and, particularly, the resist exposure with photoelectrons from the substrate and mask are the main factors determining the distinctive features of the structure profile.
		Mathematical simulation of the structure profile in the negative resist: a) distribution of exposure D throughout the resist volume; b) distribution of relative volume variation in the exposure area; c) structure profile formed in the resist.
		Structures in the positive (a and b) and negative (c) resist at vertical (a) and off-normal X-ray incidence (b and c).
	www.nanomaker.ru /home.asp?artId=32 (1821 words)

	United States Patent: 5,376,497 (Site not responding. Last check: )
		The positive resist composition according to claim 1, wherein the hydroxyl groups of the hydroxy compound are modified in a proportion of 1-100% on the average by the conversion reaction.
		The positive resist composition according to this invention is generally used in a state that it is dissolved in a solvent so as to apply it onto a substrate.
		In the positive resist composition according to this invention, may be contained one or more of compatible additives such as a dye, surfactant, storage stabilizer, another sensitizer, anti-striation agent and plasticizer, as needed.
	www.webpatent.com /patents/p5376497.htm (5319 words)

	Positive type radiation-sensitive resin composition - Patent 5087548
		Therefore, when the irradiated resist is developed with a developing solution consisting of an aqueous alkaline solution, the light-unirradated portions which form a resist pattern are very small in solubility change, and therefore, a resist pattern is obtained which is faithful to the mask and has a high resolution.
		The resist pattern thus obtained was observed by means of a scanning electron microscope to find that no undeveloped portion, namely no developing residue was recognized in the adhesion portion between the substrate and the resist pattern and that a resist pattern having a line width of 0.8.mu.m was resolved.
		The resist pattern thus obtained was observed by means of a scanning electron microscope to find that resolution was possible until a line width of 1.1.mu.m, but a developing residue was recognized in the portion at which the resist pattern contacted the substrate.
	www.freepatentsonline.com /5087548.html (3973 words)

	Photolithography
		For positive resists, the resist is exposed with UV light wherever the underlying material is to be removed.
		Negative resists were popular in the early history of integrated circuit processing, but positive resist gradually became more widely used since they offer better process controllability for small geometry features.
		This undersoft-baked positive resists is then readily attacked by the developer in both exposed and unexposed areas, causing less etching resistance.
	www.ece.gatech.edu /research/labs/vc/theory/photolith.html (929 words)

	Photomasks and reticles for semiconductors
		Before resist is applied to a substrate, the surface is cleaned to remove any traces of contamination from the surface of the wafer such as dust, organic, ionic and metallic compounds and a layer of silicon dioxide is formed by a wet or dry oxidation process.
		The cleaned wafer is subject to priming, to aid the adhesion of the resist to the surface of the substrate material.
		Preparation of the resist is concluded by a pre-bake, where the wafer is gently heated in a convection oven and then a hotplate to evaporate the resist solvent and to partially solidify the resist.
	www.photo-sciences.com /pages/technology.htm (484 words)

	[No title]
		Negative resists The first commercial chemical amplification resist was a three-component negative system consisting of a novolac resin, a photochemical acid generator, and a melamine cross-linker which undergoes acid-catalyzed condensation with the phenolic resin (Scheme III) [25].
		Positive resists As mentioned earlier, the chemical amplification concept based on photochemically induced acid catalysis has had a significant impact on the design of positive resists.
		The IBM resist, a terpolymer of t-butyl methacrylate, methacrylic acid, and methyl methacrylate (x = 0, Scheme X) was first developed for dry-film laser direct writing [48], but has subsequently been found to function as a high-resolution single-layer positive resist at 193 nm.
	www.research.ibm.com /journal/rd/411/ito.txt (4629 words)

	talisman
		This positively impacted the timing discordance—bass and treble come and go in sync—which in turn affected reverb trails.
		The $38.50 Ionoclast uses a piezo-ceramic spark generator to blast the CD with positive and negative ions, similar to the old-fashioned Zerostat (which now sells for $75 from Audio Advisor).
		Images don't undergo the same degree of compaction and firming, and I'm pleased to note that timbre is affected in a positive way.
	www.positive-feedback.com /Issue30/talisman.htm (3252 words)

	Emory and CDC Scientists Explore Why Most Breast-Fed Infants of HIV-Positive Mothers Resist Infection
		Although prolonged breastfeeding is well known to be a major route of transmission of HIV infection to infants and is estimated to cause one-third to one-half of new infant HIV-1 infections worldwide, the majority of breastfed infants with HIV-positive mothers remain uninfected, even after months of exposure.
		The presence of HIV antibody in saliva already has been recognized in HIV-infected individuals, but scientists do not yet know whether this antibody is developed in non-infected breastfed infants, or whether it has a protective role against HIV.
		Natural killer (NK) cells or natural antibodies to HIV in exposed mucosal surfaces of infants could also play a role in resistance to HIV infection.
	www.charitywire.com /charity290/04550.html (503 words)

	CultTVman: Acid-Etching part 2
		Of course, this resist film is so applied as to represent the shape of the part we wish to produce, be the finished acid-etched piece a ship railing, the silhouette of a man, or the most complicated lattice type radar antenna reflector.
		However, in recent times, photo resist, owing mostly to the use of the acid-etching process by those wishing to cut their own circuit boards (and the reason that most of the chemicals needed are found at electronic supply outlets) is today packaged in more reasonably sized quantities.
		With a positive type photo resist, those portions of the photo resist not exposed to an UV source (and that's what the contact transparency, described later, does) will remain unaffected by the developer and remain tightly bonded to the sheet, protecting its surface(s) from the environment.
	culttvman.com /acid-etching_part_2.html (2057 words)

	Semiconductor OneSource: Semiconductor Glossary -- Search For : resist
		resist which is initially soluble in the developer but becomes insoluble after irradiation; cross-linking between polymeric chains take place during irradiation; features lower resolution than positive resist but is more sensitive.
		resist which is initially insoluble in the developer and becomes soluble as a result of irradiation; chain scission takes place in the resist structure during irradiation; allows higher resolution than negative resist but is less sensitive.
		resist removal; process in which resist is removed from the surface when its is not needed any longer, i.e.
	semiconductorglossary.com /?searchterm=resist (641 words)

	Dev. of Liftoff Processes
		We have therefore decided to investigate suitability of the JSR SC1827 material for the positive resist lift-off process, as well as attempt to develop a negative resist lift-off process which has fewer steps than the positive resist lift-off, and is therefore more cost- and time-effective.
		In order to reverse the tone of the image in the positive resist so that it functions as a negative resist, a so-called image reversal method is used in which after exposure the resist layer is subjected to amine vapors.
		Next, a layer of positive photoresist is spinned on top of the polyimide-template sandwich, followed by the exposure of the photoresist using the laser stepper.
	www.phys.ufl.edu /~nanoscale/reports/year1/liftoff.html (1059 words)

	Resist (Site not responding. Last check: )
		A typical method for fabricating micro- and nanostructures (such as semiconductor computer chips, MEMS or microfluidic devices) is to create pattern out of a resist on a surface, and then etch or chemically modify the un-protected areas of the surface.
		Resists can be patterened by a variety of methods, such as photolithography (a photoresist), electron beam lithography (an electron beam resist), nanoimprint lithography (an imprint resist), etc. A resist that is weakened by exposure to the patterning method (e.g.
		light, electrons, mechanical force, etc.) is termed a positive resist, while a resist that is strengthened upon exposure is termed a negative resist.
	www.nanoword.net /library/def/Resist.htm (115 words)

	Using Pulsed Photomagnetic Curing from XENON Corporation
		Previously, resist patterns were used primarily as stencil masks for wet chemical etching of oxides and metals.
		The emerging technologies seldom require wet chemical masking, and the resist must now be able to maintain its integrity during high dosage of ion bombardment and exposures to a wide variety of ionized gases.
		Techniques such as the PRIST (Photo Resist Image Stability Technique) 131 and deep UV curing have been offered as methods to allow positive resist to be baked beyond its normal flow temperature prior to ion implantation or plasma etching 141.
	www.xenoncorp.com /positive.html (579 words)

	Willson Research Group - Water Soluble Resist
		Regarding the positive tone, the design of an aqueous positive tone resist is particularly challenging because it requires incorporation of two solubility switches.
		We reported a water castable, water developable negative tone resist based on the acid catalyzed cross-linking of poly(methyl acrylimidoglycolate methyl ether), 1, [poly(MAGME)](1), the components of which are depicted in Scheme 2.
		The water soluble sulfonium salt 2 was used to selectively produce acids in the exposed areas and 1,4-hexanediol 3 was used as a bifunctional “cross-linker.” Cross-linking results from a variety of mechanisms, including transesterification and alcoholysis of the aminal functionality.
	willson.cm.utexas.edu /Research/Sub_Files/Water_Soluble (1575 words)

	Litho Processes: EBeam Resists
		Most positive resists require a sizing in the range of -0.04 to -0.08 depending on resist type, contrast, thickness, and development.
		However, the resist thickness is highly sensitive to the solvent concentration; ie diluting the resist by a factor of two will reduce the thickness by an amount much greater than a factor of two.
		This resist has found to not have the scumming problems that SAL has and people are resolving smaller features.
	snf.stanford.edu /Process/Lithography/ebeamres.html (983 words)

	CNF - Electron Beam Lithography Resist Capabilities
		BEFORE you can do any resist processing, you must be familiar with the chemicals you will be using, and know and respect the dangers of them.
		It is most useful in Bi-level resists with PMMA, to produce undercut profiles useful in liftoff processing.
		EBR-9 is a fast, medium resolution positive resist used mostly for mask masking.
	www.cnf.cornell.edu /cnf_process_ebl_resists.html (0 words)

	Leadership & Cadence: Feedback — Emergency Medical Services (EMSResponder.com)
		Despite this, the recipient should avoid justifying their position by countering that the sender is wrong.
		If feedback is not positive, resist the temptation to respond by stonewalling or sulking.
		It also reflects positively on one's ability to be an effective leader.
	www.emsresponder.com /article/article.jsp?siteSection=20&id=4337 (1201 words)

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