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| | Anuario de Pesquisa Unicamp 1999 2909000000 (Site not responding. Last check: 2007-10-09) |
 | | A.C. Saragossa Ramos, J.A. Diniz, Peter Jurgen Tatsch e Jacobus Willibrordus Swart, "ECR etchnig of III-V compound semiconductors in BCl3/Ar at low BCl3 flows", ICMP 99, 1, 29-32, Brasil, (1999). |
 | | Anna Paula Sotero F. Macedo, J.A. Diniz, Peter Jurgen Tatsch e Jacobus Willibrordus Swart, "Silicon Oxide Grown by Microwave Plasma Oxidation on Si Substrates for MOS Devices", ICMP 99, 1, 160-163, Brasil, (1999). |
 | | J.A. Diniz, A.L. Couto, Iouri Danilov, Peter Jurgen Tatsch e Jacobus Willibrordus Swart, "Silicon Oxynitride Deposited by N2/O2/Ar/SiH4 ECR-CVD Plasma or Grown by N2/Os/Ar ECR Plasma Oxidation on Si Substrates for MOS Devices", ICMP 99, s/n, 164-167, Brasil, (1999). |
| www.unicamp.br /anuario/99/feec-dsif-p-04202.html (446 words) |
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